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    • China SiC Epitaxial Manufacturer, Supplier, Factory

    As a professional SiC Epitaxial manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable SiC Epitaxial made in China, you can leave us a message.

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    • CVD TaC Coating Crucible

      CVD TaC Coating Crucible

      VeTek Semiconductor is a professional manufacturer and leader of CVD TaC Coating Crucible products in China. CVD TaC Coating Crucible is based on tantalum carbon (TaC) coating. The tantalum carbon coating is evenly covered on the surface of the crucible through chemical vapor deposition (CVD) process to enhance its heat resistance and corrosion resistance. It is a material tool specially used in high temperature extreme environments. Welcome your further consultation.
    • Epi wafer holder

      Epi wafer holder

      VeTek Semiconductor is a professional Epi Wafer Holder manufacturer and factory in China. Epi Wafer Holder is a wafer holder for the epitaxy process in semiconductor processing. It is a key tool to stabilize the wafer and ensure uniform growth of the epitaxial layer. It is widely used in epitaxy equipment such as MOCVD and LPCVD. It is an irreplaceable device in the epitaxy process. Welcome your further consultation.
    • Graphite Thermal Field

      Graphite Thermal Field

      At Vetek Semiconductor, our graphite thermal fields are meticulously designed to meet the stringent standards of the photovoltaic industry, ensuring optimal performance and efficiency across various applications. We are dedicated to producing and supplying high-performance graphite thermal fields that offer exceptional quality and cost-effectiveness.Pls no hesitate to contact us.
    • Wafer Handling Robotic Arm

      Wafer Handling Robotic Arm

      Vetek Semiconductor thermal spraying technology plays a vital role in the application of wafer handling robotic arms, especially in semiconductor manufacturing environments that require high precision and high cleanliness. This technology significantly improves the durability, reliability and work efficiency of the equipment by coating special materials on the surface of the wafer handling robotic arm. Welcome to inquiry us.
    • GaN Epitaxy susceptor

      GaN Epitaxy susceptor

      VeTek Semiconductor is a Chinese company that is a world-class manufacturer and supplier of GaN Epitaxy susceptor. We have been working in the semiconductor industry such as silicon carbide coatings and GaN Epitaxy susceptor for a long time. We can provide you with excellent products and favorable prices. VeTek Semiconductor looks forward to becoming your long-term partner.
    • silicon carbide ceramic coating graphite heater

      silicon carbide ceramic coating graphite heater

      As a professional silicon carbide ceramic coating graphite heater manufacturer and supplier in China, Silicon Carbide Ceramic Coating Graphite Heater is a high-performance heater made of graphite substrate and coated with silicon carbon ceramic (SiC) coating on its surface. With its composite material design, this product provides excellent heating solutions in semiconductor manufacturing. Welcome your inquiry.
    • Related Blog
    • Reviews

    • How much do you know about CVD SiC ?

      CVD SiC is a high-purity silicon carbide material manufactured by chemical vapor deposition. It is mainly used for various components and coatings in semiconductor processing equipment. The following content is an introduction to the product classification and core functions of CVD SiC

    • Based on 8-inch silicon carbide single crystal growth furnace technology

      Silicon carbide is one of the ideal materials for making high-temperature, high-frequency, high-power and high-voltage devices. In order to improve production efficiency and reduce costs, the preparation of large-size silicon carbide substrates is an important development direction.

    • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

      The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

    • Do you know about MOCVD Susceptor?

      This article mainly introduces the product types, product characteristics and main functions of MOCVD Susceptor in semiconductor processing, and makes a comprehensive analysis and interpretation of MOCVD Susceptor products as a whole.

    • Application of TaC-Coated Graphite Parts in Single Crystal Furnaces

      In the growth of SiC and AlN single crystals using the physical vapor transport (PVT) method, crucial components such as the crucible, seed holder, and guide ring play a vital role. As depicted in Figure 2 [1], during the PVT process, the seed crystal is positioned in the lower temperature region, while the SiC raw material is exposed to higher temperatures (above 2400 ℃).

    • Chip manufacturing: A process flow of MOSFET

      The chip manufacturing process includes photolithography,etching, diffusion, thin film, ion implantation, chemical mechanical polishing, cleaning, etc. This article roughly explains how these processes are integrated in sequence to manufacture a MOSFET.

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