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  • GaN-on-SiC Epitaxial Wafers Carrier

    • China GaN-on-SiC Epitaxial Wafers Carrier Manufacturer, Supplier, Factory

    As a professional GaN-on-SiC Epitaxial Wafers Carrier manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable GaN-on-SiC Epitaxial Wafers Carrier made in China, you can leave us a message.

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    • Thermal spraying technology MLCC capacitor

      Thermal spraying technology MLCC capacitor

      Vetek Semiconductor thermal spraying technology plays an extremely important role in the coating application of sintered crucibles for high-end multilayer ceramic capacitor (MLCC) materials. With the continuous miniaturization and high performance of electronic devices, the demand for thermal spraying technology MLCC capacitors is also growing rapidly, especially in high-end applications. In order to meet this demand, the crucibles used in the sintering process must have excellent high temperature resistance, corrosion resistance and good thermal conductivity, all of which can be achieved and improved by thermal spraying technology. Looking forward to setting up long term business with you.
    • Silicon Carbide Ceramic Coating

      Silicon Carbide Ceramic Coating

      As a professional Silicon Carbide Ceramic Coating manufacturer and supplier in China, Vetek Semiconductor's Silicon Carbide Ceramic Coating is widely used on key components of semiconductor manufacturing equipment, especially when CVD and PECVD processes are involved. Welcome your inquiry.
    • TaC Coating Rotation Susceptor

      TaC Coating Rotation Susceptor

      As a professional manufacturer, innovator and leader of TaC Coating Rotation Susceptor products in China. VeTek Semiconductor TaC Coating Rotation Susceptor is usually installed in chemical vapor deposition (CVD) and molecular beam epitaxy (MBE) equipment to support and rotate wafers to ensure uniform material deposition and efficient reaction. It is a key component in semiconductor processing. Welcome your further consultation.
    • CVD TaC Coating Carrier

      CVD TaC Coating Carrier

      VeTek Semiconductor's CVD TaC Coating carrier is mainly designed for the epitaxial process of semiconductor manufacturing. CVD TaC Coating carrier’s Ultra-high melting point, excellent corrosion resistance, and outstanding thermal stability determine the indispensability of this product in semiconductor epitaxial process.we sincerely hope to build a long-term business relationship with you.
    • Silicon-based GaN Epitaxial Susceptor

      Silicon-based GaN Epitaxial Susceptor

      VeTek Semiconductor is a professional manufacturer and supplier, dedicated to providing high-quality Silicon-based GaN Epitaxial Susceptor. The susceptor semiconductor is used in VEECO K465i GaN MOCVD system, high purity, high temperature resistance, corrosion resistance, welcome to inquire and cooperate with us!
    • LPE Halfmoon SiC EPI Reactor

      LPE Halfmoon SiC EPI Reactor

      VeTek Semiconductor is a professional LPE Halfmoon SiC EPI Reactor product manufacturer, innovator and leader in China. LPE Halfmoon SiC EPI Reactor is a device specifically designed for producing high-quality silicon carbide (SiC) epitaxial layers, mainly used in the semiconductor industry. VeTek Semiconductor is committed to providing leading technology and product solutions for the semiconductor industry, and welcomes your further inquiries.
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    • A complete explanation of the chip manufacturing process (2/2): from wafer to packaging and testing

      Thin film deposition is vital in chip manufacturing, creating micro devices by depositing films under 1 micron thick via CVD, ALD, or PVD. These processes build semiconductor components through alternating conductive and insulating films.

    • How much do you know about sapphire?

      This article describes that LED substrate is the largest application of sapphire, as well as the main methods of preparing sapphire crystals: growing sapphire crystals by the Czochralski method, growing sapphire crystals by the Kyropoulos method, growing sapphire crystals by the guided mold method, and growing sapphire crystals by the heat exchange method.

    • Tantalum carbide technology breakthrough, SiC epitaxial pollution reduced by 75%?

      Recently, the German research institute Fraunhofer IISB has made a breakthrough in the research and development of tantalum carbide coating technology, and developed a spray coating solution that is more flexible and environmentally friendly than the CVD deposition solution, and has been commercialized.

    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

    • Chip Manufacturing: Atomic Layer Deposition (ALD)

      In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

    • How to prepare CVD TaC coating?

      This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.

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