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    • China SiC epitaxial susceptor Manufacturer, Supplier, Factory

    As a professional SiC epitaxial susceptor manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable SiC epitaxial susceptor made in China, you can leave us a message.

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    • Silicon Carbide wafer Carrier

      Silicon Carbide wafer Carrier

      As a professional Silicon Carbide wafer carrier supplier in China, VeTek Semiconductor SiC wafer carrier is a tool specially used for handling and processing semiconductor wafers, which plays an irreplaceable role in the semiconductor wafer process. Welcome to your further consultation.
    • Carbon Carbon Composite PECVD Pallet

      Carbon Carbon Composite PECVD Pallet

      VeTek Semiconductor is a leading Carbon Carbon Composite PECVD Pallet manufacturer and innovator in China.We have been specialized in Carbon related material for many years.Our products are made of high density carbon fiber. We look forward to becoming your long-term partner in China.
    • Upper Halfmoon Part SiC Coated

      Upper Halfmoon Part SiC Coated

      VeTek Semiconductor is a leading supplier of customized Upper Halfmoon Part SiC coated in China, specializing in advanced materials for over 20 years. VeTek Semiconductor Upper Halfmoon Part SiC coated is specifically designed for SiC epitaxial equipment, serving as a crucial component in the reaction chamber. Made from ultra-pure, semiconductor-grade graphite, it ensures excellent performance. We invite you to visit our factory in China.
    • SiC Coating Collector Top

      SiC Coating Collector Top

      Welcome to VeTek Semiconductor, your trusted manufacturer of CVD SiC coatings. We take pride in offering Aixtron SiC Coating Collector Top, which are expertly engineered using high purity graphite and feature a state-of-the-art CVD SiC coating with impurity below 5ppm. Please don't hesitate to reach out to us with any questions or inquiries
    • Silicon On Insulator Wafer

      Silicon On Insulator Wafer

      VeTek Semiconductor is a professional Chinese manufacturer of Silicon On Insulator Wafer, ALD Planetary Base, and TaC Coated Graphite Base. VeTek Semiconductor's Silicon On Insulator Wafer is an important semiconductor substrate material, and its excellent product characteristics make it play a key role in high-performance, low-power, high-integration and RF applications. We look forward to further cooperation with you.
    • Thermal spraying technology MLCC capacitor

      Thermal spraying technology MLCC capacitor

      Vetek Semiconductor thermal spraying technology plays an extremely important role in the coating application of sintered crucibles for high-end multilayer ceramic capacitor (MLCC) materials. With the continuous miniaturization and high performance of electronic devices, the demand for thermal spraying technology MLCC capacitors is also growing rapidly, especially in high-end applications. In order to meet this demand, the crucibles used in the sintering process must have excellent high temperature resistance, corrosion resistance and good thermal conductivity, all of which can be achieved and improved by thermal spraying technology. Looking forward to setting up long term business with you.
    • Related Blog
    • Reviews

    • Different technical routes of SiC epitaxial growth furnace

      Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

    • Chip Manufacturing: Atomic Layer Deposition (ALD)

      In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

    • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

      SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

    • What is Porous Graphite? - VeTek Semiconductor

      This article describes the physical parameters and product characteristics of VeTek Semiconductor's Porous Graphite, as well as its specific applications in semiconductor processing.

    • Material of silicon carbide epitaxy

      The material of silicon carbide epitaxial layer is silicon carbide, which is usually used to manufacture high-power electronic devices and LEDs. It is widely used in the semiconductor industry due to its excellent thermal stability, mechanical strength and high electrical conductivity.

    • The Problems in the Etching Process

      Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

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