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TaC Coated Ring for SiC Epitaxial Reactor
  • TaC Coated Ring for SiC Epitaxial ReactorTaC Coated Ring for SiC Epitaxial Reactor
  • TaC Coated Ring for SiC Epitaxial ReactorTaC Coated Ring for SiC Epitaxial Reactor
  • TaC Coated Ring for SiC Epitaxial ReactorTaC Coated Ring for SiC Epitaxial Reactor

TaC Coated Ring for SiC Epitaxial Reactor

VeTek Semiconductor is a large-scale TaC Coated Ring for SiC Epitaxial Reactor manufacturer and innovator in China.We have been specialized in TaC coating for many years.Our products have high purity, high stability, excellent corrosion resistance, high bond strength.We look forward to becoming your long-term partner in China.

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Product Description

Product Introduction of the TaC Coated Ring for SiC Epitaxial Reactor

VeTek Semiconductor is a renowned company based in China, known for its expertise in manufacturing high-quality TaC and SiC coatings, as well as high-purity TaC Coated Ring for SiC Epitaxial Reactor. We take pride in offering superior products at competitive prices. We warmly invite you to reach out to us and discover the exceptional solutions we provide.

Our TaC Coated Rings for SiC Epitaxial Reactors play a crucial role. These rings are an integral part of our halfmoon set, offering essential functions such as substrate support, precise temperature control, effective heat insulation, efficient ventilation, and reliable protection. By working harmoniously, these rings ensure meticulous control over the thickness, doping, and defect characteristics of the SiC epitaxial layer grown within the reaction chamber.

In addition to our exceptional TaC Coated Rings, VeTek Semiconductor offers an extensive range of related products specifically designed for reaction chambers. Our product lineup includes upper and lower halfmoons, protective covers, insulation covers, and process air diversion interfaces. Each of these components undergoes meticulous SiC or TaC coating to enhance performance and extend their lifespan.


Product parameter of the TaC Coated Ring for SiC Epitaxial Reactor

Physical properties of TaC coating
Density 14.3 (g/cm³)
Specific emissivity 0.3
Thermal expansion coefficient 6.3 10-6/K
Hardness (HK) 2000 HK
Resistance 1×10-5 Ohm*cm
Thermal stability <2500℃
Graphite size changes -10~-20um
Coating thickness ≥20um typical value (35um±10um)


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Overview of the semiconductor chip epitaxy industry chain:


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