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What’s the specific application of TaC coated parts in the semiconductor field?

2024-11-22

Vetek Tantalum carbide coating parts



Physical properties of tantalum carbide (TaC) coating



Physical properties of TaC coating
Tantalum carbide (TaC) coating Density
14.3 (g/cm³)
Specific emissivity
0.3
Thermal expansion coefficient
6.3*10-6/K
TaC coating Hardness (HK)
2000 HK
Resistance
1×10-5 Ohm*cm
Thermal stability
<2500℃
Graphite size changes
-10~-20um
Coating thickness
≥20um typical value (35um±10um)


The application of tantalum carbide (TaC) coating in the semiconductor field


1. Epitaxial growth reactor components

TaC coating is widely used in epitaxial chemical vapor deposition (CVD) reactor components of gallium nitride (GaN) and silicon carbide (SiC), including wafer carriers, satellite dishes, nozzles and sensors. These components require extremely high durability and stability in high temperature and corrosive environments. TaC coating can effectively extend their service life and improve yield.


2. Single crystal growth component

In the single crystal growth process of materials such as SiC, GaN and aluminum nitride (AIN), TaC coating is applied to key components such as crucibles, seed crystal holders, guide rings and filters. Graphite materials with TaC coating can reduce impurity migration, improve crystal quality and reduce defect density.


3. High temperature industrial components

TaC coating can also be used in high temperature industrial applications such as resistive heating elements, injection nozzles, shielding rings and brazing fixtures. These components need to maintain good performance in high-temperature environments, and TaC's heat resistance and corrosion resistance make it an ideal choice.


4. Heaters in MOCVD systems

TaC-coated graphite heaters have been successfully introduced in metal organic chemical vapor deposition (MOCVD) systems. Compared with traditional pBN-coated heaters, TaC heaters can provide better efficiency and uniformity, reduce power consumption, and reduce surface emissivity, thereby improving integrity.


5. Wafer carriers

TaC-coated wafer carriers play an important role in the preparation of third-generation semiconductor materials such as SiC, AIN and GaN. Studies have shown that the corrosion rate of TaC coatings in high-temperature ammonia and hydrogen environments is much lower than that of SiC coatings, which makes it show better stability and durability in long-term use.

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