Porous Graphite

As a professional Porous Graphite manufacturer in China, Porous Graphite produced by VeTek Semiconductor is a key consumable in the semiconductor manufacturing process, and its performance directly affects the quality and reliability of semiconductor devices. Welcome to consult further.

VeTek Semiconductor Porous Graphite plays an irreplaceable role in semiconductor processing, as follows:

High-temperature melting container: The high melting point of Porous Graphite enables it to withstand the high-temperature melting process of semiconductor materials, while the porous structure effectively inhibits the generation of bubbles and ensures the high purity of the melt.

Atmosphere protection carrier: Porous Graphite can provide a relatively stable inert atmosphere, reduce the contact between the melt and the external environment, and avoid oxidation and contamination.

Heat transfer medium: The excellent thermal conductivity of Porous Graphite ensures uniform distribution of melt temperature and is conducive to uniform growth of crystals.

Support and fixation: Graphite Crucible provides stable support for the melt to prevent its deformation.

Gas diffusion channel: The structure of Porous Graphite provides a diffusion channel for the gas generated in the melt, which helps to reduce gas pressure and avoid crystal defects.

As a professional manufacturer of GaN on SiC epi susceptor, Porous Graphite and TaC Coating Plate in China, VeTek Semiconductor always insists on providing customized product services, and is committed to providing the industry with top technology and product solutions. We sincerely look forward to your consultation.

Porous Graphite physical properties:

Porous Graphite production shops:

Overview of the semiconductor chip epitaxy industry chain：