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China Solid Silicon Carbide Manufacturer, Supplier, Factory

VeTek Semiconductor Solid Silicon Carbide is an important ceramic component in plasma etching equipment, solid silicon carbide(CVD silicon carbide) parts in the etching equipment include focusing rings, gas showerhead, tray, edge rings, etc. Due to the low reactivity and conductivity of solid silicon carbide(CVD silicon carbide) to chlorine - and fluorine-containing etching gases, it is an ideal material for plasma etching equipment focusing rings and other components

For example, the focus ring is an important part placed outside the wafer and in direct contact with the wafer, by applying a voltage to the ring to focus the plasma passing through the ring, thereby focusing the plasma on the wafer to improve the uniformity of processing. The traditional focus ring is made of silicon or quartz, conductive silicon as a common focus ring material, it is almost close to the conductivity of silicon wafers, but the shortage is poor etching resistance in fluorine-containing plasma, etching machine parts materials often used for a period of time, there will be serious corrosion phenomenon, seriously reducing its production efficiency.


Comparison of Si Based Focusing Ring and CVD SiC Focusing Ring
Item Si CVD SiC
Density (g/cm3) 2.33 3.21
Band gap (eV) 1.12 2.3
Thermal conductivity (W/cm℃) 1.5 5
CTE (x10-6/℃) 2.6 4
Elastic modulus (GPa) 150 440
Hardness (GPa) 11.4 24.5
Resistance to wear and corrosion Poor Excellent


VeTek Semiconductor offers advanced solid silicon carbide (CVD silicon carbide) parts like SiC focusing rings for semiconductor equipment. Our solid silicon carbide focusing rings outperform traditional silicon in terms of mechanical strength, chemical resistance, thermal conductivity, high-temperature durability, and ion etching resistance.


Key features of our SiC focusing rings include:

High density for reduced etching rates.

Excellent insulation with a high bandgap.

High thermal conductivity and low coefficient of thermal expansion.

Superior mechanical impact resistance and elasticity.

High hardness, wear resistance, and corrosion resistance.

Manufactured using plasma-enhanced chemical vapor deposition (PECVD) techniques, our SiC focusing rings meet the increasing demands of etching processes in semiconductor manufacturing. They are designed to withstand higher plasma power and energy, specifically in capacitively coupled plasma (CCP) systems.

VeTek Semiconductor's SiC focusing rings provide exceptional performance and reliability in semiconductor device manufacturing. Choose our SiC components for superior quality and efficiency.


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As a professional Solid Silicon Carbide manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Solid Silicon Carbide made in China, you can leave us a message.
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