CVD SiC coating Heating Element plays a core role in heating materials in PVD furnace (Evaporation Deposition). VeTek Semiconductor is a leading CVD SiC coated Heating Element manufacturer in China. We have advanced CVD coating capabilities and can provide you with customized CVD SiC coating products. VeTek Semiconductor looks forward to becoming your partner in SiC coated Heating Element.
CVD SiC coating Heating Element is mainly used in PVD (physical vapor deposition) equipment. In the evaporation process, the material is heated to achieve evaporation or sputtering, and finally a uniform thin film is formed on the substrate.
Ⅰ. Specific application
Thin film deposition: CVD SiC coating Heating Element is used in evaporation source or sputtering source. By heating, the element heats the material to be deposited to a high temperature, so that its atoms or molecules are separated from the surface of the material, thereby forming vapor or plasma. Our Heating Element based SiC coating can also directly heat some metal or ceramic materials to evaporate or sublimate them in a vacuum environment for use as a material source in the PVD process. Because the structure has concentric grooves, it can better control the current path and heat distribution to ensure the uniformity of heating.
Schematic diagram of the evaporation PVD process
Ⅱ. Working principle
Resistive heating, when the current passes through the resistance path of the sic coated heater, Joule heat is generated, thereby achieving the effect of heating. The concentric structure allows the current to be evenly distributed. A temperature control device is usually connected to the element to monitor and adjust the temperature.
Ⅲ. Material and structural design
CVD SiC coating Heating Element is made of high-purity graphite and SiC coating to cope with high temperature environment. High-purity graphite itself has been widely used as a thermal field material. After a layer of coating is applied on the graphite surface by CVD method, its high-temperature stability, corrosion resistance, thermal efficiency and other characteristics are further improved.
The design of concentric grooves allows the current to form a uniform loop on the disk surface. It achieves uniform heat distribution, avoids local overheating caused by concentration in certain areas, reduces additional heat loss caused by current concentration, and thus improves heating efficiency.
The CVD SiC coating Heating Element consists of two legs and a body. Each leg has a thread that connects to the power supply. VeTek Semiconductor can make one-piece parts or split parts, that is, the legs and body are made separately and then assembled. No matter what requirements you have for the CVD SiC coated Heater, please consult us. VeTekSemi can provide the products you need.
Basic physical properties of CVD SiC coating:
Basic physical properties of CVD SiC coating
Property
Typical Value
Crystal Structure
FCC β phase polycrystalline, mainly (111) oriented
Density
3.21 g/cm³
Hardness
2500 Vickers hardness(500g load)
Grain SiZe
2~10μm
Chemical Purity
99.99995%
Heat Capacity
640 J·kg-1·K-1
Sublimation Temperature
2700℃
Flexural Strength
415 MPa RT 4-point
Young' s Modulus
430 Gpa 4pt bend, 1300℃
Thermal Conductivity
300W·m-1·K-1
Thermal Expansion(CTE)
4.5×10-6K-1