English
Home > Products > Chemical Vapor Deposition

China Chemical Vapor Deposition Manufacturer, Supplier, Factory

We are ready to share our knowledge of marketing worldwide and recommend you suitable products at most aggressive costs. So Profi Tools offer you finest benefit of money and we are ready to produce alongside one another with Chemical Vapor Deposition,Solid SiC,CVD Bulk SiC,Etching Process,Etching Focusing Ring, We sincerely stay up for hearing from you. Give us a chance to show you our professionalism and passion. We've been sincerely welcome superior mates from numerous circles at dwelling and overseas come to cooperate!
Chemical Vapor Deposition, Welcome any of your inquiries and concerns for our products. We look forward to establishing a long-term business relationship with you in the near future. Contact us today. We are the first business partner to suit your needs!

Related Products

Hot Products

  • Tantalum Carbide Guide Ring

    Tantalum Carbide Guide Ring

    VeTek Semiconductor is a professional manufacturer and leader of Tantalum Carbide Guide Ring products in China. Our Tantalum Carbide (TaC) Guide Ring is a high-performance ring component made of tantalum carbide, which is commonly used in semiconductor processing equipment, especially in high-temperature and highly corrosive environments such as CVD, PVD, etching and diffusion. VeTek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry, and welcomes your further inquiries.
  • Fused Opaque Quartz

    Fused Opaque Quartz

    As a VeTek Semiconductor's fused opaque quartz features low transmittance and high thermal reflectivity, which can significantly reduce heat loss and thereby extend the life of heating components. Ultra-long service life, suitable for semiconductor heat treatment processes. VeTek Semiconductor is a professional supplier and manufacturer of fused opaque quartz and looks forward to becoming your long-term partner.
  • TaC Coating Rotation Susceptor

    TaC Coating Rotation Susceptor

    As a professional manufacturer, innovator and leader of TaC Coating Rotation Susceptor products in China. VeTek Semiconductor TaC Coating Rotation Susceptor is usually installed in chemical vapor deposition (CVD) and molecular beam epitaxy (MBE) equipment to support and rotate wafers to ensure uniform material deposition and efficient reaction. It is a key component in semiconductor processing. Welcome your further consultation.
  • TaC Coating Susceptor

    TaC Coating Susceptor

    VeTek Semiconductor presents the TaC Coating Susceptor, With its exceptional TaC coating, this susceptor offers a multitude of advantages that set it apart from conventional solutions.Integrating seamlessly into existing systems, the TaC Coating Susceptor from VeTek Semiconductor guarantees compatibility and efficient operation. Its reliable performance and high-quality TaC coating consistently deliver exceptional results in SiC epitaxy processes.We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
  • TaC Coated Guide Ring

    TaC Coated Guide Ring

    TaC Coated Guide Ring is made of high-quality graphite and TaC coating. In the preparation of SiC crystals by PVT method, VeTek Semiconductor's TaC coated guide ring is mainly used to guide and control the airflow, optimize the single crystal growth process, and improve the single crystal yield. With excellent TaC coating technology, our products have excellent high temperature resistance, corrosion resistance and good mechanical properties. We sincerely welcome your consultation and look forward to providing you with more detailed product information and technical support.
  • Horizontal SiC Wafer Carrier

    Horizontal SiC Wafer Carrier

    VeTek Semiconductor is a professional manufacturer and supplier of TaC coated guide ring, horizontal SiC wafer carrier, and SiC coated susceptors in China. We are committed to providing perfect technical support and ultimate product solutions for the semiconductor industry. Welcome to contact us.
  • Related Blog
  • Reviews

  • Uses of solid silicon carbide

    Solid silicon carbide has excellent properties such as high temperature stability, high hardness, good abrasion resistance, and good chemical stability, so it has a wide range of applications. The following are some applications of solid silicon carbide:

  • Chip Manufacturing: Atomic Layer Deposition (ALD)

    In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

  • Porous Tantalum Carbide: A new generation of materials for SiC crystal growth

    VeTek Semiconductor's Porous Tantalum Carbide, as a new generation of SiC crystal growth material, has many excellent product properties and plays a key role in a variety of semiconductor processing technologies.

  • What is TaC Coating ? - VeTek Semiconductor

    This article mainly introduces the product types, product characteristics and main functions of TaC Coating in semiconductor processing, and makes a comprehensive analysis and interpretation of TaC Coating products as a whole.

  • Diamond - the future star of semiconductors

    Diamond, a potential fourth-generation "ultimate semiconductor," is gaining attention in semiconductor substrates due to its exceptional hardness, thermal conductivity, and electrical properties. While its high cost and production challenges limit its use, CVD is the preferred method. Despite doping and large-area crystal challenges, diamond holds promise.

  • The Problems in the Etching Process

    Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

Related Search

Chemical Vapor Deposition (CVD)Chemical Vapor Deposition (CVD) processChemical Vapor deposition (CVD) reactorChemical Vapor Deposition PROCESSChemical vapor deposition susceptorhigh-temperature chemical vapor deposition (HTCVD)Low Pressure Chemical Vapor Deposition (LPCVD)metal organic chemical vapor deposition (MOCVD)MOCVD (metal organic chemical vapor deposition) equipmentPECVD (Plasma-Enhanced Chemical Vapor Deposition)

Send Inquiry

Hit enter to search or ESC to close
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept