2024-08-15
TaC Coating (Tantalum Carbide Coating) is a high-performance coating material produced by chemical vapor deposition (CVD) process. Due to the excellent properties of TaC coating under extreme conditions, it is widely used in semiconductor manufacturing process, especially in equipment and components that require high temperature and strong corrosive environment. TaC Coating is usually used to protect substrates (such as graphite or ceramics) from damage by high temperature, corrosive gases and mechanical wear.
Physical properties of TaC coating |
|
TaC coating Density |
14.3 (g/cm³) |
Specific emissivity |
0.3 |
Thermal expansion coefficient |
6.3*10-6/K |
Coating Hardness (HK) |
2000 HK |
Resistance |
1×10-5 Ohm*cm |
Thermal stability |
<2500℃ |
Graphite size changes |
-10~-20um |
Coating thickness |
≥20um typical value (35um±10um) |
● Extremely high thermal stability:
Feature description: TaC coating has a melting point of more than 3880°C and can maintain stability without decomposition or deformation in extremely high temperature environment.
Advantage: This makes it an indispensable material in high-temperature semiconductor equipment such as CVD TaC Coating and TaC Coated Susceptor, especially for applications in MOCVD reactors, such as Aixtron G5 equipment.
● Excellent corrosion resistance:
Feature description: TaC has extremely strong chemical inertness and can effectively resist the erosion of corrosive gases such as chlorides and fluorides.
Advantages: In semiconductor processes involving highly corrosive chemicals, TaC Coating protects equipment components from chemical attack, prolongs service life and improves process stability, especially in the application of Silicon Carbide Wafer Boat and other key components.
● Excellent mechanical hardness:
Feature description: The hardness of TaC coating is as high as 9-10 Mohs, which makes it resistant to mechanical wear and high temperature stress.
Advantage: The high hardness property makes TaC Coating particularly suitable for use in high wear and high stress environments, ensuring the long-term stability and reliability of equipment under harsh conditions.
● Low chemical reactivity:
Feature description: Due to its chemical inertness, TaC Coating can maintain low reactivity in high temperature environments and avoid unnecessary chemical reactions with reactive gases.
Advantage: This is especially important in the semiconductor manufacturing process because it ensures the purity of the process environment and high-quality deposition of materials.
● Protecting key equipment components:
Function description: TaC coating is widely used in key components of semiconductor manufacturing equipment, such as TaC Coated Susceptor, which need to work under extreme conditions. By coating with TaC, these components can operate for long periods of time in high temperature and corrosive gas environments without being damaged.
● Extend equipment life:
Function description: In MOCVD equipment such as Aixtron G5, TaC Coating can significantly improve the durability of equipment components and reduce the need for equipment maintenance and replacement due to corrosion and wear.
● Enhance process stability:
Function description: In semiconductor manufacturing, TaC Coating ensures the uniformity and consistency of the deposition process by providing a stable high temperature and chemical environment. This is particularly important in epitaxial growth processes such as silicon epitaxy and gallium nitride (GaN).
● Improve process efficiency:
Function description: By optimizing the coating on the surface of the equipment, TaC Coating can improve the overall efficiency of the process, reduce the defect rate, and increase the product yield. This is critical for the manufacture of high-precision, high-purity semiconductor materials.
The high thermal stability, excellent corrosion resistance, mechanical hardness and low chemical reactivity exhibited by TaC Coating during semiconductor processing make it an ideal choice for protecting semiconductor manufacturing equipment components. As the semiconductor industry's demand for high temperature, high purity and efficient manufacturing processes continues to increase, TaC Coating has broad application prospects, especially in equipment and processes involving CVD TaC Coating, TaC Coated Susceptor and Aixtron G5.
VeTek semiconductor Technology Co., LTD is a leading provider of advanced coating materials for the semiconductor industry. our company focus on developing cutting-edge solutions for the industry.
Our main product offerings include CVD silicon carbide (SiC) coatings, tantalum carbide (TaC) coatings, bulk SiC, SiC powders, and high-purity SiC materials, SiC coated graphite susceptor, preheat rings, TaC coated diversion ring, halfmoon parts, etc., the purity is below 5ppm, can meet customer requirements.
VeTek semiconductor focus on developing cutting-edge technology and product development solutions for the semiconductor industry. We sincerely hope to become your long-term partner in China.