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  • SiC Tube for Semiconductor

    • China SiC Tube for Semiconductor Manufacturer, Supplier, Factory

    As a professional SiC Tube for Semiconductor manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable SiC Tube for Semiconductor made in China, you can leave us a message.

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    • LPE Halfmoon SiC EPI Reactor

      LPE Halfmoon SiC EPI Reactor

      VeTek Semiconductor is a professional LPE Halfmoon SiC EPI Reactor product manufacturer, innovator and leader in China. LPE Halfmoon SiC EPI Reactor is a device specifically designed for producing high-quality silicon carbide (SiC) epitaxial layers, mainly used in the semiconductor industry. VeTek Semiconductor is committed to providing leading technology and product solutions for the semiconductor industry, and welcomes your further inquiries.
    • Silicon Pedestal

      Silicon Pedestal

      VeTek Semiconductor Silicon Pedestal is a key component in semiconductor diffusion and oxidation processes. As a dedicated platform for carrying silicon boats in high-temperature furnaces, the Silicon Pedestal has many unique advantages, including improved temperature uniformity, optimized wafer quality, and enhanced performance of semiconductor devices. For more product information, please feel free to contact us.
    • CVD SiC Coating Baffle

      CVD SiC Coating Baffle

      Vetek Semiconductor's CVD SiC Coating Baffle is mainly used in Si Epitaxy. It is usually used with silicon extension barrels. It combines the unique high temperature and stability of the CVD SiC Coating Baffle, which greatly improves the uniform distribution of airflow in semiconductor manufacturing. We believe that our products can bring you Advanced Technology and High-Quality Product Solutions.
    • CVD SiC Coated Barrel Susceptor

      CVD SiC Coated Barrel Susceptor

      VeTek Semiconductor is a leading manufacturer and innovator of CVD SiC Coated Barrel Susceptor in China. Our CVD SiC Coated Barrel Susceptor plays a key role in promoting the epitaxial growth of semiconductor materials on wafers with its excellent product characteristics. Welcome to your further consultation.
    • SiC Coated Graphite Barrel Susceptor for EPI

      SiC Coated Graphite Barrel Susceptor for EPI

      VeTek Semiconductor is a professional manufacturer, supplier and exporter for the SiC coated graphite barrel susceptor for EPI. Supported by a professional team and leading technology, VeTek Semiconductor can provide you high quality at reasonable prices. we welcome you to visit our factory for further discussion.
    • SiC coated Satellite cover for MOCVD

      SiC coated Satellite cover for MOCVD

      As a leading manufacturer and supplier of SiC coated Satellite cover for MOCVD products in China, Vetek Semiconductor SiC coated Satellite cover for MOCVD products have extreme high temperature resistance, excellent oxidation resistance and excellent corrosion resistance, playing an irreplaceable role in ensuring high-quality epitaxial growth on wafers. Welcome your further inquiries.
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    • GaN-based low-temperature epitaxy technology

      This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

    • Diamond - the future star of semiconductors

      Diamond, a potential fourth-generation "ultimate semiconductor," is gaining attention in semiconductor substrates due to its exceptional hardness, thermal conductivity, and electrical properties. While its high cost and production challenges limit its use, CVD is the preferred method. Despite doping and large-area crystal challenges, diamond holds promise.

    • ALD Atomic Layer Deposition Recipe

      Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.

    • Roll up! Two major manufacturers are about to mass produce 8-inch silicon carbide

      As the 8-inch silicon carbide (SiC) process matures, manufacturers are accelerating the shift from 6-inch to 8-inch. Recently, ON Semiconductor and Resonac announced updates on 8-inch SiC production.

    • Chip manufacturing: A process flow of MOSFET

      The chip manufacturing process includes photolithography,etching, diffusion, thin film, ion implantation, chemical mechanical polishing, cleaning, etc. This article roughly explains how these processes are integrated in sequence to manufacture a MOSFET.

    • Sanan Optoelectronics Co., Ltd.: 8-inch SiC chips are expected to be put into production in December!

      As a leading manufacturer in the SiC industry, Sanan Optoelectronics' related dynamics have received widespread attention in the industry. Recently, Sanan Optoelectronics disclosed a series of latest developments, involving 8-inch transformation, new substrate factory production, establishment of new companies, government subsidies and other aspects.

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