As a leading manufacturer and supplier of diffusion furnace equipment in China, VeTek Semiconductor SiC Diffusion Furnace Tube has significantly high bending strength, excellent resistance to oxidation, corrosion resistance, high wear resistance, and excellent high-temperature mechanical properties. Making it an indispensable equipment material in diffusion furnace applications. VeTek Semiconductor is committed to manufacturing and supplying high-quality SiC Diffusion Furnace Tube, and welcomes your further inquiries.
Working Schematic Diagram of SiC Diffusion Furnace Tube
VeTek Semiconductor SiC Diffusion Furnace Tube has the following product advantages:
Excellent High Temperature Mechanical Properties: SiC Diffusion Furnace Tube has the best high temperature mechanical properties of any known ceramic material, including excellent strength and creep resistance. This makes it particularly suitable for applications requiring long term stability at high temperatures.
Excellent Oxidation Resistance: VeTek Semiconductor's SiC Diffusion Furnace Tube has excellent oxidation resistance, the best of all non-oxide ceramics. This property ensures long term stability and performance in high temperature environments, reducing the risk of degradation and extending the life of the tube.
● High Flexural Strength: VeTekSemi SiC Diffusion Furnace Tube has a flexural strength of over 200MPa, ensuring excellent mechanical properties and structural integrity under the high stress conditions typical of semiconductor manufacturing processes.
● Excellent Corrosion Resistance: The chemical inertness of SiC Furnace Tube provides excellent corrosion resistance, making these tubes ideal for use in the harsh chemical environments often encountered in semiconductor processing.
● High Wear Resistance: SiC tube furnaces have strong wear resistance, which is essential for maintaining dimensional stability and reducing maintenance requirements when used for long periods of time in abrasive conditions.
● With CVD coating: VeTek semiconductor chemical vapor deposition (CVD) sic coating has a purity level greater than 99.9995%, impurity content less than 5ppm, and harmful metal impurities less than 1ppm. The CVD coating process ensures that the tube meets the strict vacuum tightness requirements of 2-3Torr, which is critical for high-precision semiconductor manufacturing environments.
● Application in diffusion furnaces: These sic tubes are designed for semiconductor diffusion furnaces, where they play a key role in high-temperature processes such as doping and oxidation. Their advanced material properties ensure that they can withstand the harsh conditions of these processes, thereby improving the efficiency and reliability of semiconductor production.
VeTek Semiconductor has long been committed to providing advanced technology and product solutions for the semiconductor industry, and supports professional customized services. Choosing VeTek Semiconductor's SiC Diffusion Furnace Tube, you will get a product with excellent performance and high reliability to meet the various needs of modern semiconductor manufacturing. We sincerely hope to be your long-term partner in China.
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