MOCVD LED Epi Susceptor

VeTek Semiconductor’s MOCVD LED Epi Susceptor is a core component. In the preparation process of semiconductor devices, MOCVD LED Epi Susceptor is not only a simple heating platform, but also a precision process tool, which has a profound impact on the quality, growth rate, uniformity and other aspects of thin film materials.

The specific uses of MOCVD LED Epi Susceptor in semiconductor processing are as follows:

Substrate heating and uniformity control:

MOCVD Epitaxy Susceptor is used to provide uniform heating to ensure stable temperature of substrate during epitaxial growth. This is essential for obtaining high-quality semiconductor films and ensuring consistency in thickness and crystal quality of epitaxial layers across the substrate.

Support for Chemical Vapor Deposition (CVD) Reactor Chambers:

As an important component in the CVD reactor, Susceptor supports the deposition of metal organic compounds on substrates. It helps to accurately convert these compounds into solid films to form the desired semiconductor materials.

Promote gas distribution:

The design of Susceptor can optimize the flow distribution of gases in the reaction chamber, ensuring that the reaction gas contacts the substrate evenly, thereby improving the uniformity and quality of epitaxial films.

You can rest assured to buy customized MOCVD LED Epi Susceptor from us, we look forward to cooperating with you. If you want to know more information, you can consult us immediately and we will reply you in time!

Basic physical properties of CVD SiC coating:

Production shops:

Overview of the semiconductor chip epitaxy industry chain：