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China semiconductor wafer fabrication Manufacturer, Supplier, Factory

As a professional semiconductor wafer fabrication manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable semiconductor wafer fabrication made in China, you can leave us a message.

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  • SiC Wafer Boat

    SiC Wafer Boat

    VeTek Semiconductor's SiC Wafer Boat is a very high performance product. Our SiC Wafer Boat is usually used in semiconductor oxidation diffusion furnaces to ensure that the temperature is evenly distributed on the wafer and improve the silicon wafer processing quality. The high temperature stability and high thermal conductivity of SiC materials ensure efficient and reliable semiconductor processing. We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
  • MOCVD LED Epi Susceptor

    MOCVD LED Epi Susceptor

    VeTek Semiconductor is a professional manufacturer of MOCVD LED Epi Susceptor, ALD Planetary Susceptor, TaC Coated Graphite Susceptor in China. VeTek Semiconductor's MOCVD LED Epi Susceptor is designed for demanding epitaxial equipment applications. Its high thermal conductivity, chemical stability and durability are key factors to ensure a stable epitaxial growth process and high-quality semiconductor film production. We look forward to further cooperation with you.
  • CVD TaC Coating Crucible

    CVD TaC Coating Crucible

    VeTek Semiconductor is a professional manufacturer and leader of CVD TaC Coating Crucible products in China. CVD TaC Coating Crucible is based on tantalum carbon (TaC) coating. The tantalum carbon coating is evenly covered on the surface of the crucible through chemical vapor deposition (CVD) process to enhance its heat resistance and corrosion resistance. It is a material tool specially used in high temperature extreme environments. Welcome your further consultation.
  • TaC coated ring for PVT growth of SiC single crystal

    TaC coated ring for PVT growth of SiC single crystal

    As one of the leading TaC coating product suppliers in China, VeTek Semiconductor is able to provide customers with high-quality TaC coating customized parts. TaC coated ring for PVT growth of SiC single crystal is one of VeTek Semiconductor's most outstanding and mature products. It plays an important role in the PVT growth of SiC crystal process and can help customers grow high-quality SiC crystals. Looking forward to your inquiry.
  • TaC Coating Tube

    TaC Coating Tube

    As a professional TaC Coating Tube manufacturer and supplier in China, VeTek Semiconductor's TaC coating tube is a key component for the successful growth of silicon carbide single crystals. With its high temperature resistance, chemical inertness and excellent performance, it ensures the production of high-quality crystals with consistent results. Trust our innovative solutions to enhance your PVT method SiC crystal growth process and achieve excellent results.Welcome to inquiry us.
  • CVD SiC coating Heating Element

    CVD SiC coating Heating Element

    CVD SiC coating Heating Element plays a core role in heating materials in PVD furnace (Evaporation Deposition). VeTek Semiconductor is a leading CVD SiC coated Heating Element manufacturer in China. We have advanced CVD coating capabilities and can provide you with customized CVD SiC coating products. VeTek Semiconductor looks forward to becoming your partner in SiC coated Heating Element.
  • Related Blog
  • Reviews

  • Principles and Technology of Physical Vapor Deposition (PVD) Coating (2/2) - VeTek Semiconductor

    Electron beam evaporation is a highly efficient and widely used coating method compared to resistance heating, which heats the evaporation material with an electron beam, causing it to vaporize and condense into a thin film.

  • Uses of solid silicon carbide

    Solid silicon carbide has excellent properties such as high temperature stability, high hardness, good abrasion resistance, and good chemical stability, so it has a wide range of applications. The following are some applications of solid silicon carbide:

  • The Problems in the Etching Process

    Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

  • What is semiconductor epitaxy process?

    It is ideal to build integrated circuits or semiconductor devices on a perfect crystalline base layer. The epitaxy (epi) process in semiconductor manufacturing aims to deposit a fine single-crystalline layer, usually about 0.5 to 20 microns, on a single-crystalline substrate. The epitaxy process is an important step in the manufacture of semiconductor devices, especially in silicon wafer manufacturing.

  • What is the difference between epitaxy and ALD?

    The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

  • How thin can the Taiko process make silicon wafers?

    The Taiko process thins silicon wafers using its principles, technical advantages and process origins.

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