CVD SiC Graphite Cylinder

Vetek Semiconductor’s CVD SiC Graphite Cylinder is pivotal in semiconductor equipment, serving as a protective shield within reactors to safeguard internal components in high temperature and pressure settings. It effectively shields against chemicals and extreme heat, preserving equipment integrity. With exceptional wear and corrosion resistance, it ensures longevity and stability in challenging environments. Utilizing these covers enhances semiconductor device performance, prolongs lifespan, and mitigates maintenance requirements and damage risks.Welcome to inquiry us.

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Product Description

Vetek Semiconductor's CVD SiC Graphite Cylinder plays an important role in semiconductor equipment. It is usually used as a protective cover inside the reactor to provide protection for the internal components of the reactor in high temperature and high pressure environments. This protective cover can effectively isolate the chemicals and high temperatures in the reactor, preventing them from causing damage to the equipment. At the same time, CVD SiC Graphite Cylinder also has excellent wear and corrosion resistance, making it able to maintain stability and long-term durability in harsh working environments. By using protective covers made of this material, the performance and reliability of semiconductor devices can be improved, extending the service life of the device while reducing maintenance needs and the risk of damage.

CVD SiC Graphite Cylinder has a wide range of applications in semiconductor equipment, including but not limited to the following aspects:

Heat treatment equipment: CVD SiC Graphite Cylinder can be used as a protective cover or heat shield in heat treatment equipment to protect internal components from high temperatures while providing excellent high temperature resistance.

Chemical Vapor deposition (CVD) reactor: In the CVD reactor, CVD SiC Graphite Cylinder can be used as a protective cover for the chemical reaction chamber, effectively isolating the reaction substance and providing corrosion resistance.

Applications in corrosive environments: Due to its excellent corrosion resistance, CVD SiC Graphite Cylinder can be used in chemically corroded environments, such as corrosive gas or liquid environments during semiconductor manufacturing.

Semiconductor growth equipment: Protective covers or other components used in semiconductor growth equipment to protect equipment from high temperatures, chemical corrosion and wear to ensure equipment stability and long-term reliability.

High temperature stability, corrosion resistance, excellent mechanical properties, thermal conductivity.With these excellent performance, it helps to dissipate heat more efficiently in semiconductor devices, maintaining the stability and performance of the device.

Basic physical properties of CVD SiC coating:

Basic physical properties of CVD SiC coating
Property	Typical Value
Crystal Structure	FCC β phase polycrystalline, mainly (111) oriented
Density	3.21 g/cm³
Hardness	2500 Vickers hardness（500g load）
Grain SiZe	2~10μm
Chemical Purity	99.99995%
Heat Capacity	640 J·kg-1·K-1
Sublimation Temperature	2700℃
Flexural Strength	415 MPa RT 4-point
Young' s Modulus	430 Gpa 4pt bend, 1300℃
Thermal Conductivity	300W·m-1·K-1
Thermal Expansion(CTE)	4.5×10-6K-1