CVD TaC Coating Crucible
  • CVD TaC Coating CrucibleCVD TaC Coating Crucible

CVD TaC Coating Crucible

VeTek Semiconductor is a professional manufacturer and leader of CVD TaC Coating Crucible products in China. CVD TaC Coating Crucible is based on tantalum carbon (TaC) coating. The tantalum carbon coating is evenly covered on the surface of the crucible through chemical vapor deposition (CVD) process to enhance its heat resistance and corrosion resistance. It is a material tool specially used in high temperature extreme environments. Welcome your further consultation.

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Product Description

TaC Coating Rotation Susceptor plays a key role in high temperature deposition processes such as CVD and MBE, and is an important component for wafer processing in semiconductor manufacturing. Among them, TaC Coating has excellent high temperature resistance, corrosion resistance and chemical stability, which ensures high precision and high quality during wafer processing.


CVD TaC Coating Crucible usually consists of TaC Coating and graphite substrate. Among them, TaC is a high melting point ceramic material with a melting point of up to 3880°C. It has extremely high hardness (Vickers hardness up to 2000 HV), chemical corrosion resistance and strong oxidation resistance. Therefore, TaC Coating is an excellent high temperature resistant material in semiconductor processing technology.

The graphite substrate has good thermal conductivity (thermal conductivity is about 21 W/m·K) and excellent mechanical stability. This characteristic determines that graphite becomes an ideal coating substrate.


CVD TaC Coating Crucible is mainly used in the following semiconductor processing technologies:


Wafer manufacturing: VeTek Semiconductor CVD TaC Coating Crucible has excellent high temperature resistance (melting point up to 3880°C) and corrosion resistance, so it is often used in key wafer manufacturing processes such as high temperature vapor deposition (CVD) and epitaxial growth. Combined with the product's excellent structural stability in ultra-high temperature environments, it ensures that the equipment can operate stably for a long time under extremely harsh conditions, thereby effectively improving the production efficiency and quality of wafers.


Epitaxial growth process: In epitaxial processes such as chemical vapor deposition (CVD) and molecular beam epitaxy (MBE), CVD TaC Coating Crucible plays a key role in carrying. Its TaC Coating can not only maintain the high purity of the material under extreme temperature and corrosive atmosphere, but also effectively prevent the contamination of the reactants on the material and the corrosion of the reactor, ensuring the accuracy of the production process and product consistency.


As China's leading CVD TaC Coating Crucible manufacturer and leader, VeTek Semiconductor can provide customized products and technical services according to your equipment and process requirements. We sincerely hope to become your long-term partner in China.


Tantalum carbide (TaC) coating on a microscopic cross-section


Tantalum carbide (TaC) coating on a microscopic cross-section 1Tantalum carbide (TaC) coating on a microscopic cross-section 2Tantalum carbide (TaC) coating on a microscopic cross-section 3Tantalum carbide (TaC) coating on a microscopic cross-section 4


Physical properties of TaC coating


Physical properties of TaC coating
Density
14.3 (g/cm³)
Specific emissivity
0.3
Thermal expansion coefficient
6.3*10-6/K
Hardness (HK)
2000 HK
Resistance
1×10-5 Ohm*cm
Thermal stability
<2500℃
Graphite size changes
-10~-20um
Coating thickness
≥20um typical value (35um±10um)


VeTek Semiconductor CVD TaC Coating Crucible shops:


CVD TaC Coating Crucible shops



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