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China Quartz Manufacturer, Supplier, Factory

As a professional Quartz manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Quartz made in China, you can leave us a message.

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  • CVD SiC coating graphite susceptor

    CVD SiC coating graphite susceptor

    VeTek Semiconductor CVD SiC coating graphite susceptor is one of the important components in the semiconductor industry such as epitaxial growth and wafer processing. It is used in MOCVD and other equipment to support the processing and handling of wafers and other high-precision materials. VeTek Semiconductor has China's leading SiC coated graphite susceptor and TaC Coated Graphite Susceptor production and manufacturing capabilities, and looks forward to your consultation.
  • CVD SiC coating Heating Element

    CVD SiC coating Heating Element

    CVD SiC coating Heating Element plays a core role in heating materials in PVD furnace (Evaporation Deposition). VeTek Semiconductor is a leading CVD SiC coated Heating Element manufacturer in China. We have advanced CVD coating capabilities and can provide you with customized CVD SiC coating products. VeTek Semiconductor looks forward to becoming your partner in SiC coated Heating Element.
  • Carbon Carbon Composite PECVD Pallet

    Carbon Carbon Composite PECVD Pallet

    VeTek Semiconductor has been focusing on the research and development and production of carbon-based materials for many years. Our Carbon Carbon Composite PECVD Pallet is made of high-density carbon fiber, which has excellent high temperature resistance, good mechanical properties and excellent chemical stability, and plays an irreplaceable role in the photovoltaic PECVD process. We look forward to your inquiry and establishing a long-term strategic partnership with you to jointly promote technological progress and industrial development.
  • MOCVD Susceptor

    MOCVD Susceptor

    MOCVD Susceptor is characteristed with planetary disc and profesional for its stable performance in epitaxy. Vetek semiconductor has rich experience in machining and CVD SiC coating of this product, welcome to communicate with us about real cases.
  • Silicon Carbide Wafer Chuck

    Silicon Carbide Wafer Chuck

    As a leading manufacturer and supplier of Silicon Carbide Wafer Chuck products in China, VeTek Semiconductor's Silicon Carbide Wafer Chuck plays an irreplaceable role in the epitaxial growth process with its excellent high temperature resistance, chemical corrosion resistance and thermal shock resistance. Welcome your further consultation.
  • VEECO MOCVD Susceptor

    VEECO MOCVD Susceptor

    As a leading manufacturer and supplier of VEECO MOCVD Susceptor products in China, VeTek Semiconductor's MOCVD Susceptor represents the pinnacle of innovation and engineering excellence, specially customized to meet the complex requirements of contemporary semiconductor manufacturing processes. Welcome your further inquiries.
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  • Italy's LPE's 200mm SiC epitaxial technology progress

    This article introduces the latest developments in the newly designed PE1O8 hot-wall CVD reactor of the Italian company LPE and its ability to perform uniform 4H-SiC epitaxy on 200mm SiC.

  • The Development History of 3C SiC

    Through continuous technological progress and in-depth mechanism research, 3C-SiC heteroepitaxial technology is expected to play a more important role in the semiconductor industry and promote the development of high-efficiency electronic devices.

  • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

    The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

  • How to achieve high quality crystal growth? - SiC crystal growth furnace

    With the theme of "How to achieve high quality crystal growth? - SiC crystal growth furnace", this blog conducts a detailed analysis from four dimensions: the basic principle of silicon carbide crystal growth furnace, the structure of the silicon carbide crystal growth furnace, technical difficulties of silicon carbide crystal growth furnace, and raw materials for growing high-quality SiC crystals.

  • What is the epitaxial process?

    This blog takes "What is the epitaxial process?" as its theme, and provides a detailed analysis from the dimensions of Overview of Epitaxial Processes, Types of Epitaxy, Factors Influencing the Epi Process, Epitaxial Growth Techniques, EPI Growth Modes, and Epitaxy Growth’s Importance.

  • GaN-based low-temperature epitaxy technology

    This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

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