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    • China Power Device Manufacturer, Supplier, Factory

    As a professional Power Device manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Power Device made in China, you can leave us a message.

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    • Porous SiC Ceramic Chuck

      Porous SiC Ceramic Chuck

      Vetek Semiconductor offers Porous SiC Ceramic Chuck widely used in wafer processing technology, transfer and other links, suitable for bonding, scribing, patch, polishing and other links, laser processing. Our Porous SiC Ceramic Chuck has Ultra-strong vacuum adsorption, high flatness and high purity meet the needs of most semiconductor industries.Welcome to inquiry us.
    • SiC coating ALD susceptor

      SiC coating ALD susceptor

      As a professional SiC coating ALD susceptor manufacturer and supplier in China, VeTek Semiconductor's SiC coating ALD susceptor is a support component specifically used in the atomic layer deposition (ALD) process. It plays a key role in the ALD equipment, ensuring the uniformity and precision of the deposition process. We believe that our ALD Planetary Susceptor products can bring you high-quality product solutions.
    • TaC Coated Three-petal Ring

      TaC Coated Three-petal Ring

      VeTek Semiconductor is a leading TaC Coated Three-petal Ring manufacturer and innovator in China.We have been specialized in TaC and SiC coating for many years.Our products have a corrosion resistance, high strength. We look forward to becoming your long-term partner in China.
    • SiC Coated ICP Etching Carrier

      SiC Coated ICP Etching Carrier

      VeTek Semiconductor's SiC Coated ICP Etching Carrier is designed for the most demanding epitaxy equipment applications. Made of high-quality ultra-pure graphite material, our SiC Coated ICP Etching Carrier has a highly flat surface and excellent corrosion resistance to withstand the harsh conditions during handling. The high thermal conductivity of the SiC coated carrier ensures even heat distribution for excellent etching results. VeTek Semiconductor looks forward to building a long-term partnership with you.
    • Hot Zone graphite heater

      Hot Zone graphite heater

      VeTek Semiconductor Hot Zone graphite heater is designed to handle the extreme conditions in high temperature furnaces and maintain excellent performance and stability in complex processes such as chemical vapor deposition (CVD), epitaxial growth and high temperature annealing. VeTekSemi always focuses on producing and providing high-quality Hot Zone graphite heaters to ensure the best cost-effectiveness for customers. We sincerely invite you to contact us.
    • Pre-Heat Ring

      Pre-Heat Ring

      VeTek Semiconductor is a innovator of SiC coating manufacturer in China.Pre-Heat Ring provided by VeTek Semiconductor is designed for Epitaxy process. The uniform silicon carbide coating and high-end graphite material as raw materials ensure consistent deposition and improve the quality and uniformity of the epitaxial layer.We are looking forward to setting up long term cooperation with you.
    • Related Blog
    • Reviews

    • What’s the difference between Silicon Carbide and Tantalum Carbide Coatings?

      This article analyzes the product characteristics and application scenarios of tantalum carbide coating and silicon carbide coating from multiple perspectives.

    • Exploratory application of 3D printing technology in the semiconductor industry

      In an era of rapid technological development, 3D printing, as an important representative of advanced manufacturing technology, is gradually changing the face of traditional manufacturing. With the continuous maturity of technology and the reduction of costs, 3D printing technology has shown broad application prospects in many fields such as aerospace, automobile manufacturing, medical equipment, and architectural design, and has promoted the innovation and development of these industries.

    • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

      SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

    • Semiconductor substrate wafer: Material properties of silicon, GaAs, SiC and GaN

      The article analyzes the material properties of semiconductor substrate wafers such as silicon, GaAs, SiC and GaN

    • Application of TaC-Coated Graphite Parts in Single Crystal Furnaces

      In the growth of SiC and AlN single crystals using the physical vapor transport (PVT) method, crucial components such as the crucible, seed holder, and guide ring play a vital role. As depicted in Figure 2 [1], during the PVT process, the seed crystal is positioned in the lower temperature region, while the SiC raw material is exposed to higher temperatures (above 2400 ℃).

    • What is semiconductor epitaxy process?

      It is ideal to build integrated circuits or semiconductor devices on a perfect crystalline base layer. The epitaxy (epi) process in semiconductor manufacturing aims to deposit a fine single-crystalline layer, usually about 0.5 to 20 microns, on a single-crystalline substrate. The epitaxy process is an important step in the manufacture of semiconductor devices, especially in silicon wafer manufacturing.

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