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Porous SiC Ceramic Chuck
  • Porous SiC Ceramic ChuckPorous SiC Ceramic Chuck
  • Porous SiC Ceramic ChuckPorous SiC Ceramic Chuck

Porous SiC Ceramic Chuck

Vetek Semiconductor offers Porous SiC Ceramic Chuck widely used in wafer processing technology, transfer and other links, suitable for bonding, scribing, patch, polishing and other links, laser processing. Our Porous SiC Ceramic Chuck has Ultra-strong vacuum adsorption, high flatness and high purity meet the needs of most semiconductor industries.Welcome to inquiry us.

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Product Description


Vetek Semiconductor's Porous SiC Ceramic Chuck  has been well received by many customers and enjoyed a good reputation in many countries. Vetek Semiconductor Porous Ceramic Vaccum Chuck have characteristic design & practical performance & competitive price, for more information on the Porous Ceramic Vaccum Chuck, please feel free to contact us.

Porous SiC Ceramic Chuck are also called micro-porosity vacuum cups, the general porosity can be adjusted to 2~100um size, refers to the special nano powder manufacturing process to produce a uniform solid or vacuum sphere, through high temperature sintering in the material to generate a large number of connected or closed ceramic materials. With its special structure, it has the advantages of high temperature resistance, wear resistance, chemical corrosion resistance, high mechanical strength, easy regeneration and excellent thermal shock resistance, etc., which can be used for high temperature filtration materials, catalyst carriers, porous electrodes of fuel cells, sensitive components, separation membranes, bioceramics, etc., showing unique application advantages in chemical industry, environmental protection, energy, electronics, biochemistry and other fields.


The Porous SiC Ceramic Chuck finds extensive applications in semiconductor wafer processing and transfer processes. It is suitable for tasks such as bonding, scribing, die attachment, polishing, and laser machining.



Our Advantages:

Customization: We tailor components to perfectly match the shape and material of your wafer, as well as your specific equipment and operational conditions.

Dimensional Precision: We can achieve dimensional precision to meet your exact specifications. For instance, we can produce chucks for 8-inch wafers with a flatness less than 3μm and for 12-inch wafers with a flatness less than 5μm.

Pore Size and Porosity: Our porous ceramic chucks feature a pore size ranging from 20-50μm and a porosity level between 35-55%, ensuring optimal performance in various processing applications.

Whether you require a single piece for evaluation or customized chucks for multiple workpieces, we are dedicated to meeting your dimensional and material requirements with precision and

excellence. Feel free to reach out to us for further inquiries or to discuss your specific needs.


Porous SiC Ceramic Chuck Product picture under microscope



Porous SiC Ceramic Property list
Item Unit Porous SiC Ceramic
Porosity um 10-30
Density g/cm3 1.2-1.3
Roughness um 2.5-3
Suction value KPA -45
Flexural strength MPa 30
Inductivity 1MHz 33
Heat transfer rate W/(m·K) 60-70


Porous SiC Ceramic Chuck Production shops:


Overview of the semiconductor chip epitaxy industry chain:

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