Pre-Heat Ring

VeTek Semiconductor is a innovator of SiC coating manufacturer in China.EPI Pre Heat Ring provided by VeTek Semiconductor is designed for Epitaxy process. The uniform silicon carbide coating and high-end graphite material as raw materials ensure consistent deposition and improve the quality and uniformity of the epitaxial layer.We are looking forward to setting up long term cooperation with you.

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Product Description

The EPI Pre Heat Ring is a key equipment specifically designed for the epitaxial (EPI) process in semiconductor manufacturing. It is used to pre-heat wafers before the EPI process, ensuring temperature stability and uniformity throughout the epitaxial growth.

Manufactured by VeTek Semiconductor, our EPI Pre Heat Ring offers several notable features and advantages. Firstly, it is constructed using high thermal conductivity materials, allowing for rapid and uniform heat transfer to the wafer surface. This prevents the formation of hotspots and temperature gradients, ensuring consistent deposition and improving the quality and uniformity of the epitaxial layer.

Additionally, our EPI Pre Heat Ring is equipped with an advanced temperature control system, enabling precise and consistent control of the pre-heat temperature. This level of control enhances the accuracy and repeatability of crucial steps such as crystal growth, material deposition, and interface reactions during the EPI process.

Durability and reliability are essential aspects of our product design. The EPI Pre Heat Ring is built to withstand high temperatures and operating pressures, maintaining stability and performance over extended periods. This design approach reduces maintenance and replacement costs, ensuring long-term reliability and operational efficiency.

Installation and operation of the EPI Pre Heat Ring are straightforward, as it is compatible with common EPI equipment. It features a user-friendly wafer placement and retrieval mechanism, enhancing convenience and operational efficiency.

At VeTek Semiconductor, we also offer customization services to meet specific customer requirements. This includes tailoring the EPI Pre Heat Ring's size, shape, and temperature range to align with unique production needs.

For researchers and manufacturers involved in epitaxial growth and semiconductor device production, the EPI Pre Heat Ring by VeTek Semiconductor provides exceptional performance and reliable support. It serves as a critical tool in achieving high-quality epitaxial growth and facilitating efficient semiconductor device manufacturing processes.

Basic physical properties of CVD SiC coating:

Basic physical properties of CVD SiC coating
Property	Typical Value
Crystal Structure	FCC β phase polycrystalline, mainly (111) oriented
Density	3.21 g/cm³
Hardness	2500 Vickers hardness（500g load）
Grain SiZe	2~10μm
Chemical Purity	99.99995%
Heat Capacity	640 J·kg-1·K-1
Sublimation Temperature	2700℃
Flexural Strength	415 MPa RT 4-point
Young' s Modulus	430 Gpa 4pt bend, 1300℃
Thermal Conductivity	300W·m-1·K-1
Thermal Expansion(CTE)	4.5×10-6K-1