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    VeTek Semiconductor, a leading manufacturer of CVD SiC coatings, offers SiC Coating Set Disc in Aixtron MOCVD Reactors. These SiC Coating Set Disc are crafted using high purity graphite and feature a CVD SiC coating with impurity below 5ppm. We welcome inquiries about this product.
  • Wafer Chuck

    Wafer Chuck

    Vetek Semiconductor's wafer chuck play pivotal roles in semiconductor production, enabling fast, high-quality output. With in-house manufacturing, competitive pricing, and robust R&D support, Vetek Semiconductor excels in OEM/ODM services for precision components.Looking forward to your inquiry.
  • CVD SiC Pancake Susceptor

    CVD SiC Pancake Susceptor

    As a leading manufacturer and innovator of CVD SiC Pancake Susceptor products in China. VeTek Semiconductor CVD SiC Pancake Susceptor, as a disc-shaped component designed for semiconductor equipment, is a key element to support thin semiconductor wafers during high-temperature epitaxial deposition. VeTek Semiconductor is committed to providing high-quality SiC Pancake Susceptor products and becoming your long-term partner in China at competitive prices.
  • CVD SiC Coated Skirt

    CVD SiC Coated Skirt

    VeTek Semiconductor is a leading manufacturer, innovator and leader of CVD SiC Coating and TAC Coating in China. For many years, we have been focusing on various CVD SiC Coating products such as CVD SiC coated Skirt, CVD SiC Coating Ring, CVD SiC Coating carrier, etc. VeTek Semiconductor supports customized product services and satisfactory product prices, and looks forward to your further consultation.
  • SiC coated deep UV LED susceptor

    SiC coated deep UV LED susceptor

    SiC coated deep UV LED susceptor is designed for MOCVD process to support efficient and stable deep UV LED epitaxial layer growth. VeTek Semiconductor is a leading manufacturer and supplier of SiC coated deep UV LED susceptor in China. We have rich experience and have established long-term cooperative relationships with many LED epitaxial manufacturers.We are the top domestic manufacturer of susceptor products for LEDs. After years of verification, our product life span is on par with that of top international manufacturers. Looking forward to your inquiry.
  • 8 Inch Halfmoon Part for LPE Reactor

    8 Inch Halfmoon Part for LPE Reactor

    VeTek Semiconductor is a leading 8 Inch Halfmoon Part for LPE Reactor manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a 8 Inch Halfmoon Part for LPE Reactor designed specifically for LPE SiC epitaxy reactor. This halfmoon part a versatile and efficient solution for semiconductor manufacturing with its optimal size, compatibility, and high productivity.We welcome you to visit our factory in China.
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  • Semiconductor process: Chemical Vapor Deposition (CVD)

    Chemical vapor deposition (CVD) in semiconductor manufacturing is used to deposit thin film materials in the chamber, including SiO2, SiN, etc., and commonly used types include PECVD and LPCVD. By adjusting the temperature, pressure and reaction gas type, CVD achieves high purity, uniformity and good film coverage to meet different process requirements.

  • Tantalum carbide technology breakthrough, SiC epitaxial pollution reduced by 75%?

    Recently, the German research institute Fraunhofer IISB has made a breakthrough in the research and development of tantalum carbide coating technology, and developed a spray coating solution that is more flexible and environmentally friendly than the CVD deposition solution, and has been commercialized.

  • Do you know about MOCVD Susceptor?

    This article mainly introduces the product types, product characteristics and main functions of MOCVD Susceptor in semiconductor processing, and makes a comprehensive analysis and interpretation of MOCVD Susceptor products as a whole.

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    The four most powerful graphite manufacturers in the world: SGL, Toyo Tanso, Tokai Carbon, Mersen and their corresponding typical graphite and application areas.

  • What is semiconductor epitaxy process?

    It is ideal to build integrated circuits or semiconductor devices on a perfect crystalline base layer. The epitaxy (epi) process in semiconductor manufacturing aims to deposit a fine single-crystalline layer, usually about 0.5 to 20 microns, on a single-crystalline substrate. The epitaxy process is an important step in the manufacture of semiconductor devices, especially in silicon wafer manufacturing.

  • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

    SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

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