ALD Fused Quartz Pedestal

VeTek Semiconductor ALD Fused Quartz Pedestal plays a key role in the semiconductor manufacturing process as a support structure for the quartz boat, which is used to hold the wafer. Fused Quartz Pedestal helps achieve uniform film deposition by maintaining a stable temperature, which directly affects the performance and reliability of semiconductor devices. In addition, Quartz Pedestal ensures uniform distribution of heat and light in the process chamber, thereby improving the overall quality of the deposition process.

ALD Fused Quartz Pedestal Material Advantages

High Temperature Resistance: The softening point of fused quartz pedestal is as high as about 1730°C, and it can withstand high temperature operation of 1100°C to 1250°C for a long time, and can be exposed to extreme temperature environments up to 1450°C for a short time.

Excellent Corrosion Resistance: Fused quartz is highly chemically inert to almost all acids except hydrofluoric acid. Its acid resistance is 30 times higher than ceramics and 150 times higher than stainless steel. Fused quartz is chemically unmatched at high temperatures, making it an ideal material for complex chemical processes.

Thermal stability: A key feature of the Fused Quartz Pedestal material is its extremely low coefficient of thermal expansion. This means it can easily handle dramatic temperature fluctuations without cracking. For example, fused silica quartz can be quickly heated to 1100°C and immersed directly in cold water without damage, an important feature in high-stress manufacturing conditions.

Rigorous manufacturing process: The production process of fused silica pedestals strictly adheres to high quality standards. The production process uses hot forming and welding processes, which are usually completed in a class 10,000 cleanroom environment. Afterwards, the fused quartz glass pedestal is thoroughly cleaned with ultrapure water (18 MΩ) to ensure product purity and optimal performance. Each finished product is rigorously inspected, cleaned, and packaged in a class 1,000 or higher cleanroom to meet the high standards of the semiconductor industry.

High purity opaque silica quartz material

VeTeksemi ALD Fused Quartz Pedestal uses high purity opaque quartz material to effectively isolate heat and light. Its excellent heat shielding and light shielding properties enable it to maintain uniform temperature distribution in the process chamber, ensuring uniformity and consistency of thin film deposition on the wafer surface.

Application Fields

Fused quartz pedestals are widely used in many fields of the semiconductor industry due to their excellent performance. In the atomic layer deposition (ALD) process, it supports precise control of film growth and ensures the advancement of semiconductor devices. In the low pressure chemical vapor deposition (LPCVD) process, the thermal stability and light shielding ability of high purity quartz Pedestal provide guarantees for uniform deposition of thin films, thereby improving device performance and yield.

In addition, in the diffusion wafer process, the high temperature resistance and chemical corrosion resistance of Fused Quartz Pedestal ensure the reliability and consistency of the semiconductor material doping process. These key processes determine the electrical performance of semiconductor devices, and high-quality Fused Quartz materials play an indispensable role in achieving the best results of these processes.

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