China MOCVD susceptor Manufacturer, Supplier, Factory

At Vetek Semiconductor, our graphite thermal fields are meticulously designed to meet the stringent standards of the photovoltaic industry, ensuring optimal performance and efficiency across various applications. We are dedicated to producing and supplying high-performance graphite thermal fields that offer exceptional quality and cost-effectiveness.Pls no hesitate to contact us.

Vetek Semiconductor's CVD SiC Coating Baffle is mainly used in Si Epitaxy. It is usually used with silicon extension barrels. It combines the unique high temperature and stability of the CVD SiC Coating Baffle, which greatly improves the uniform distribution of airflow in semiconductor manufacturing. We believe that our products can bring you Advanced Technology and High-Quality Product Solutions.

VeTek Semiconductor is a professional manufacturer, supplier and exporter for the SiC coated graphite barrel susceptor for EPI. Supported by a professional team and leading technology, VeTek Semiconductor can provide you high quality at reasonable prices. we welcome you to visit our factory for further discussion.

VeTek Semiconductor is a professional manufacturer of MOCVD LED Epi Susceptor, ALD Planetary Susceptor, TaC Coated Graphite Susceptor in China. VeTek Semiconductor's MOCVD LED Epi Susceptor is designed for demanding epitaxial equipment applications. Its high thermal conductivity, chemical stability and durability are key factors to ensure a stable epitaxial growth process and high-quality semiconductor film production. We look forward to further cooperation with you.

ALD process,means Atomic Layer Epitaxy process. Vetek Semiconductor and ALD system manufacturers have developed and produced SiC coated ALD Planetary Susceptors that meet the high requirements of the ALD process to evenly distribute the airflow over the substrate. At the same time, Vetek Semiconductor’s high purity CVD SiC coating ensures purity in the process. Welcome to discuss cooperation with us.

Vetek Semiconductor’s CVD SiC Coating Nozzles are crucial components used in the LPE SiC epitaxy process for depositing silicon carbide materials during semiconductor manufacturing. These nozzles are typically made of high-temperature and chemically stable silicon carbide material to ensure stability in harsh processing environments. Designed for uniform deposition, they play a key role in controlling the quality and uniformity of epitaxial layers grown in semiconductor applications.Looking forward to setting up long term cooperation with you.