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What is Tantalum Carbide TaC Coating? - VeTek Semiconductor

2024-08-22

Tantalum carbide (TaC) ceramic material has a melting point of up to 3880 ℃ and is a compound with high melting point and good chemical stability. It can maintain stable performance in high temperature environments. In addition, it also has high temperature resistance, chemical corrosion resistance, and good chemical and mechanical compatibility with carbon materials, making it an ideal graphite substrate protective coating material. 


Basic Physical properties of TaC coating
Tantalum carbide coating Density
14.3 (g/cm³)
Specific emissivity
0.3
Thermal expansion coefficient
6.3*10-6/K
TaC coating Hardness (HK)
2000 HK
Resistance
1×10-5 Ohm*cm
Thermal stability
<2500℃
Graphite size changes
-10~-20um
Coating thickness
≥20um typical value (35um±10um)
Thermal conductivity
9-22(W/m·K)

Table 1. Basic Physical properties of TaC coating


Tantalum carbide coating can effectively protect graphite components from the effects of hot ammonia, hydrogen, silicon vapor, and molten metal in harsh usage environments, significantly extending the service life of graphite components and suppressing the migration of impurities in graphite, ensuring the quality of epitaxial and crystal growth.


Common Tantalum Carbide Coated Components

Figure 1. Common Tantalum Carbide Coated Components


Chemical vapor deposition(CVD) is the most mature and optimal method for producing TaC coatings on graphite surfaces.


Using TaCl5 and Propylene as carbon and tantalum sources respectively, and argon as the carrier gas, the high-temperature vaporized TaCl5 vapor is introduced into the reaction chamber. At the target temperature and pressure, the precursor material vapor adsorbs on the surface of graphite, undergoing a series of complex chemical reactions such as decomposition and combination of carbon and tantalum sources, as well as a series of surface reactions such as diffusion and desorption of by-products of the precursor. Finally, a dense protective layer is formed on the surface of the graphite, which protects the graphite from stable existence under extreme environmental conditions and significantly expands the application scenarios of graphite materials.


Chemical vapor deposition (CVD) process principle

Figure 2. Chemical vapor deposition (CVD) process principle


VeTek Semiconductor mainly provides tantalum carbide products: TaC guide ring,TaC coated three petal ring,TaC coating crucible,TaC coating porous graphite are widely used is SiC crystal growth process;Porous Graphite with TaC Coated, TaC Coated Guide Ring, TaC Coated Graphite Wafer Carrier, TaC coating susceptors, planetary susceptor, TaC coated satellite susceptor, And these tantalum carbide coating products are widely used in SiC epitaxy process and SiC Single Crystal Growth Process.


VeTek Semiconductor's Most Popular Tantalum Carbide Coating Products

Figure 3. VeTek Semiconductor's Most Popular Tantalum Carbide Coating Products


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