Aixtron MOCVD Susceptor

The Susceptors produced by Vetek Semiconductor are made of graphite substrate and silicon carbide (SiC) coating material. Given the higher wear resistance, corrosion resistance and extremely high hardness of SiC material, it is particularly suitable for use in harsh process environments. Therefore, the Susceptors produced by Vetek Semiconductor can be directly used in high-temperature MOCVD processes without additional surface treatment.

Susceptors are key components in semiconductor manufacturing, especially in MOCVD equipment for thin film deposition processes. The main role of Aixtron SiC Susceptor in the MOCVD process is to carry semiconductor wafers, ensure uniform and high-quality deposition of thin films by providing uniform heat distribution and reaction environment, thereby achieving high-quality thin film production.

Aixtron MOCVD Susceptor is usually used to support and fix the base of semiconductor wafers to ensure the stability of the wafer during the deposition process. At the same time, the surface coating of Aixtron MOCVD Susceptor is made of silicon carbide (SiC), a highly thermally conductive material. The SiC coating ensures uniform temperature on the surface of the wafer, and uniform heating is essential for obtaining high-quality films.

Moreover, the Aixtron MOCVD Susceptor we produce plays a greater role in controlling the flow and distribution of reactive gases through the optimized design of materials. Avoid eddy currents and temperature gradients to achieve uniform film deposition.

More importantly, in the MOCVD process, the silicon carbide (SiC) coating material has corrosion resistance, so Vetek Semiconductor's Aixtron MOCVD Susceptor can also withstand high temperatures and corrosive gases.

Basic physical properties of SIC COATING:

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Overview of the semiconductor chip epitaxy industry chain: