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    • China Epitaxial Growth Manufacturer, Supplier, Factory

    As a professional Epitaxial Growth manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Epitaxial Growth made in China, you can leave us a message.

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    • 4H N-type SiC Substrate

      4H N-type SiC Substrate

      As a professional 4H N-type SiC Substrate manufacturer and supplier in China, Vetek Semiconductor 4H N-type SiC Substrate aims to provide advanced technology and product solutions for the semiconductor industry. Our 4H N-type SiC Wafer is carefully designed and manufactured with high reliability to meet the demanding requirements of the semiconductor industry. We welcome your further inquiries.
    • Silicon Carbide Epitaxy Wafer Carrier

      Silicon Carbide Epitaxy Wafer Carrier

      VeTek Semiconductor is a leading customized Silicon Carbide Epitaxy Wafer Carrier supplier in China.We have been specialized in advanced material more than 20 years.We offer a Silicon Carbide Epitaxy Wafer Carrier for carrying SiC substrate, growing SiC epitaxy layer in SiC epitaxial reactor. This Silicon Carbide Epitaxy Wafer Carrier is an important SiC coated part of halfmoon part, high temperature resistance, oxidation resistance, wear resistance. We welcome you to visit our factory in China.
    • Chemical Vapor Deposition Process Solid SiC Edge Ring

      Chemical Vapor Deposition Process Solid SiC Edge Ring

      VeTek Semiconductor is a leading Chemical Vapor Deposition Process Solid SiC Edge Ring manufacturer and innovator in China.We have been specialized in semiconductor material for many years.VeTek Semiconductor solid SiC edge ring offers improved etching uniformity and precise wafer positioning when used with an electrostatic chuck, ensuring consistent and reliable etching results.We look forward to becoming your long-term partner in China.
    • Porous Graphite with TaC Coated

      Porous Graphite with TaC Coated

      Porous Graphite with TaC Coated is an advanced semiconductor processing material provided by VeTek Semiconductor. Porous Graphite with TaC Coated combines the advantages of porous graphite and tantalum carbide (TaC) coating, with good thermal conductivity and gas permeability. VeTek Semiconductor is committed to providing quality products at competitive prices, and we look forward to being your long-term partner in China.
    • SiC Coating Collector Bottom

      SiC Coating Collector Bottom

      With our expertise in CVD SiC coating manufacturing, VeTek Semiconductor proudly presents Aixtron SiC Coating Collector Bottom. These SiC Coating Collector Bottom is constructed using high purity graphite and are coated with CVD SiC, ensuring impurity below 5ppm. Feel free to reach out to us for further information and inquiries.
    • High Purity SiC Cantilever Paddle

      High Purity SiC Cantilever Paddle

      VeTek Semiconductor is a leading manufacturer and innovator of High Purity SiC Cantilever Paddle in China. High Purity SiC Cantilever Paddles are commonly used in semiconductor diffusion furnaces as wafer transfer or loading platforms. VeTek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry. We look forward to becoming your long-term partner in China.
    • Related Blog
    • Reviews

    • Material of silicon carbide epitaxy

      The material of silicon carbide epitaxial layer is silicon carbide, which is usually used to manufacture high-power electronic devices and LEDs. It is widely used in the semiconductor industry due to its excellent thermal stability, mechanical strength and high electrical conductivity.

    • Tantalum carbide technology breakthrough, SiC epitaxial pollution reduced by 75%?

      Recently, the German research institute Fraunhofer IISB has made a breakthrough in the research and development of tantalum carbide coating technology, and developed a spray coating solution that is more flexible and environmentally friendly than the CVD deposition solution, and has been commercialized.

    • How much do you know about CVD SiC ?

      CVD SiC is a high-purity silicon carbide material manufactured by chemical vapor deposition. It is mainly used for various components and coatings in semiconductor processing equipment. The following content is an introduction to the product classification and core functions of CVD SiC

    • Principles and Technology of Physical Vapor Deposition (PVD) Coating (2/2) - VeTek Semiconductor

      Electron beam evaporation is a highly efficient and widely used coating method compared to resistance heating, which heats the evaporation material with an electron beam, causing it to vaporize and condense into a thin film.

    • GaN-based low-temperature epitaxy technology

      This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

    • Uses of solid silicon carbide

      Solid silicon carbide has excellent properties such as high temperature stability, high hardness, good abrasion resistance, and good chemical stability, so it has a wide range of applications. The following are some applications of solid silicon carbide:

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