TaC Coating Guide Rings

As a leading manufacturer of TaC Coating Guide Rings products in China, VeTek Semiconductor TaC coated guide rings are important components in MOCVD equipment, ensuring accurate and stable gas delivery during epitaxial growth, and are an indispensable material in semiconductor epitaxial growth. Welcome to consult us.

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Product Description

Function of TaC Coating Guide Rings:

Precise Gas Flow Control: The TaC Coating Guide Ring is strategically positioned within the gas injection system of the MOCVD reactor. its primary function is to direct the flow of precursor gases and ensure their uniform distribution across the substrate wafer surface. This precise control over gas flow dynamics is essential for achieving uniform epitaxial layer growth and desired material properties.

Thermal Management: The TaC Coating Guide Rings often operates at elevated temperatures due to their proximity to the heated susceptor and substrate. TaC’ s excellent thermal conductivity helps dissipate heat effectively, preventing localized overheating and maintaining a stable temperature profile within the reaction zone.

Advantages of TaC in MOCVD:

Extreme Temperature Resistance: TaC boasts one of the highest melting points among all materials, exceeding 3800°C.

Outstanding Chemical Inertness: TaC exhibits exceptional resistance to corrosion and chemical attack from the reactive precursor gases used in MOCVD, such as ammonia, silane, and various metal-organic compounds.

Physical properties of TaC coating:

Physical properties of TaC coating
Density	14.3 (g/cm³)
Specific emissivity	0.3
Thermal expansion coefficient	6.3*10^-6/K
Hardness (HK)	2000 HK
Resistance	1×10^-5 Ohm*cm
Thermal stability	<2500℃
Graphite size changes	-10~-20um
Coating thickness	≥20um typical value (35um±10um)

Benefits for MOCVD Performance:

The use of VeTek semiconductor TaC Coating Guide Ring in MOCVD equipment contributes significantly to:

Increased Equipment Uptime: The durability and extended lifespan of the TaC Coating Guide Ring reduce the need for frequent replacements, minimizing maintenance downtime and maximizing the operational efficiency of the MOCVD system.

Enhanced Process Stability: The thermal stability and chemical inertness of TaC contribute to a more stable and controlled reaction environment within the MOCVD chamber, minimizing process variations and improving reproducibility.

Improved Epitaxial Layer Uniformity: Precise gas flow control facilitated by the TaC Coating Guide Rings ensures uniform precursor distribution, resulting in highly uniform epitaxial layer growth with consistent thickness and composition.

Tantalum carbide (TaC) coating on a microscopic cross-section:

Tantalum carbide (TaC) coating on a microscopic cross-section 1