What is CVD TAC Coating?

As we all known, TaC has a melting point of up to 3880°C, high mechanical strength, hardness, thermal shock resistance; good chemical inertness and thermal stability to ammonia, hydrogen, silicon-containing vapor at high temperatures.

CVD TAC coating, chemical vapor deposition (CVD) of tantalum carbide (TaC) coating, is a process for forming a high-density and durable coating on a substrate (usually graphite). This method involves depositing TaC onto the surface of the substrate at high temperatures, resulting in a coating with excellent thermal stability and chemical resistance.

The main advantages of CVD TaC coatings include:

Extremely high thermal stability: can withstand temperatures exceeding 2200°C.

Chemical resistance: can effectively resist harsh chemicals such as hydrogen, ammonia and silicon vapor.

Strong adhesion: ensures long-lasting protection without delamination.

High purity: minimizes impurities, making it ideal for semiconductor applications.

These coatings are particularly suitable for environments that require high durability and resistance to extreme conditions, such as semiconductor manufacturing and high-temperature industrial processes.

In industrial production, graphite (carbon-carbon composite) materials coated with TaC coating are very likely to replace traditional high-purity graphite, pBN coating, SiC coating parts, etc. In addition, in the field of aerospace, TaC has great potential to be used as a high-temperature anti-oxidation and anti-ablation coating, and has broad application prospects. However, there are still many challenges to achieve the preparation of dense, uniform, non-flaking TaC coating on the surface of graphite and promote industrial mass production.

In this process, exploring the protection mechanism of the coating, innovating the production process, and competing with the top foreign level are crucial for the third-generation semiconductor crystal growth and epitaxy.