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What is CVD TAC Coating? - Veteksemi

2024-08-09

As we all known, tantalum carbide (TaC) has a melting point of up to 3880°C, high mechanical strength, hardness, thermal shock resistance; good chemical inertness and thermal stability to ammonia, hydrogen, silicon-containing vapor at high temperatures.

Tantalum carbide coating on a microscopic cross-section picture

Tantalum carbide coating on a microscopic cross-section


CVD TAC coating, chemical vapor deposition (CVD) of tantalum carbide (TaC) coating, is a process for forming a high-density and durable coating on a substrate (usually graphite). This method involves depositing TaC onto the surface of the substrate at high temperatures, resulting in a coating with excellent thermal stability and chemical resistance.


The main advantages of CVD TaC coatings include:


●  Extremely high thermal stability: Tantalum Carbide Coating can withstand temperatures exceeding 2200°C.


●  Chemical resistance: CVD TaC coating can effectively resist harsh chemicals such as hydrogen, ammonia and silicon vapor.


●  Strong adhesion: The TaC coating ensures long-lasting protection without delamination.


●  High purity: minimizes impurities, making it ideal for semiconductor applications.


Physical properties of Tantalum Carbide coating
TaC coating Density
14.3 (g/cm³)
Specific emissivity
0.3
Thermal expansion coefficient
6.3*10-6/K
Coating Hardness (HK)
2000 HK
Resistance
1×10-5 Ohm*cm
Thermal stability
<2500℃
Graphite size changes
-10~-20um
Coating thickness
≥20um typical value (35um±10um)


These coatings are particularly suitable for environments that require high durability and resistance to extreme conditions, such as semiconductor manufacturing and high-temperature industrial processes.


In industrial production, graphite (carbon-carbon composite) materials coated with TaC coating are very likely to replace traditional high-purity graphite, pBN coating, SiC coating parts, etc. In addition, in the field of aerospace, TaC has great potential to be used as a high-temperature anti-oxidation and anti-ablation coating, and has broad application prospects. However, there are still many challenges to achieve the preparation of dense, uniform, non-flaking TaC coating on the surface of graphite and promote industrial mass production.


In this process, exploring the protection mechanism of the coating, innovating the production process, and competing with the top foreign level are crucial for the third-generation semiconductor crystal growth and epitaxy.




VeTek Semiconductor is a professional Chinese manufacturer of CVD Tantalum Carbide Coating products, and our TaC Coating purity is below 5ppm, can meet customer requirements. VeTekSemi main CVD TaC Coated products include CVD TaC Coating Crucible, CVD TaC Coating Wafer Carrier, CVD TaC Coating CarrierCVD TaC Coating Cover,  CVD TaC Coating Ring. VeTek Semiconductor is committed to providing advanced solutions for various Coating products for the semiconductor industry. VeTek Semiconductor sincerely hopes to become your long-term partner in China.


VeTek CVD TaC Coating CarrierVETEK CVD TaC Coating CoverVETEK CVD TaC Coating Crucible

VETEK CVD TaC Coating RingVETEK CVD TaC Coating Wafer CarrierCVD TAC Coating PARTS


If you have any inquiries or need additional details, please don't hesitate to get in touch with us.

Mob/WhatsAPP: +86-180 6922 0752

Email: anny@veteksemi.com

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