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China Semiconductor epitaxial growth process Manufacturer, Supplier, Factory

As a professional Semiconductor epitaxial growth process manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Semiconductor epitaxial growth process made in China, you can leave us a message.

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    VeTek Semiconductor is a leading manufacturer and supplier of VEECO MOCVD heater products in China. MOCVD heater has excellent chemical purity, thermal stability and corrosion resistance. It is an indispensable product in the metal organic chemical vapor deposition (MOCVD) process. Welcome to your further inquiries.
  • Vitreous Carbon Coated Graphite Crucible for E-beam Gun

    Vitreous Carbon Coated Graphite Crucible for E-beam Gun

    VeTek Semiconductor is a leading supplier of customized Vitreous Carbon Coated Graphite Crucible for E-beam Gun in China, specializing in advanced materials for many years. Our Vitreous Carbon Coated Graphite Crucible is specifically designed for E-beam Gun, ensuring excellent performance. Made from ultra-pure imported graphite, it offers reliability and durability. Visit our factory in China to explore deep cooperation.
  • SiC Coating Set Disc

    SiC Coating Set Disc

    VeTek Semiconductor, a leading manufacturer of CVD SiC coatings, offers SiC Coating Set Disc in Aixtron MOCVD Reactors. These SiC Coating Set Disc are crafted using high purity graphite and feature a CVD SiC coating with impurity below 5ppm. We welcome inquiries about this product.
  • SiC Coated Graphite Barrel Susceptor for EPI

    SiC Coated Graphite Barrel Susceptor for EPI

    VeTek Semiconductor is a professional manufacturer, supplier and exporter for the SiC coated graphite barrel susceptor for EPI. Supported by a professional team and leading technology, VeTek Semiconductor can provide you high quality at reasonable prices. we welcome you to visit our factory for further discussion.
  • Silicon Carbide Cantilever Paddle

    Silicon Carbide Cantilever Paddle

    VeTek Semiconductor's Silicon Carbide Cantilever Paddle is an important component in the semiconductor manufacturing process, especially suitable for diffusion furnaces or LPCVD furnaces in high-temperature processes such as diffusion and RTP. Our Silicon Carbide Cantilever Paddle is carefully designed and manufactured with excellent high-temperature resistance and mechanical strength, and can safely and reliably transport wafers to the process tube under harsh process conditions for various high-temperature processes such as diffusion and RTP. We look forward to becoming your long-term partner in China.
  • SiC Coating Epi susceptor

    SiC Coating Epi susceptor

    VeTek Semiconductor is a leading manufacturer, innovator and leader of SiC Coating Epi Susceptor products in China. For many years, we have been focusing on various SiC Coating products such as SiC Coating Epi Susceptor, SiC Coating Wafer Carrier, SiC Coating Susceptor, SiC coating ALD susceptor, etc. VeTek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry. Welcome your further consultation.
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  • Roll up! Two major manufacturers are about to mass produce 8-inch silicon carbide

    As the 8-inch silicon carbide (SiC) process matures, manufacturers are accelerating the shift from 6-inch to 8-inch. Recently, ON Semiconductor and Resonac announced updates on 8-inch SiC production.

  • How to prepare CVD TaC coating? - Vetek Semiconductor

    This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.

  • Semiconductor process: Chemical Vapor Deposition (CVD)

    Chemical vapor deposition (CVD) in semiconductor manufacturing is used to deposit thin film materials in the chamber, including SiO2, SiN, etc., and commonly used types include PECVD and LPCVD. By adjusting the temperature, pressure and reaction gas type, CVD achieves high purity, uniformity and good film coverage to meet different process requirements.

  • The Development History of 3C SiC

    Through continuous technological progress and in-depth mechanism research, 3C-SiC heteroepitaxial technology is expected to play a more important role in the semiconductor industry and promote the development of high-efficiency electronic devices.

  • Why is SiC coating a key core material for SiC epitaxial growth?

    This article analyzes the reasons why SiC coating a key core material for SiC epitaxial growth and focuses on the specific advantages of SiC coating in the semiconductor industry.

  • Do you know about MOCVD Susceptor?

    This article mainly introduces the product types, product characteristics and main functions of MOCVD Susceptor in semiconductor processing, and makes a comprehensive analysis and interpretation of MOCVD Susceptor products as a whole.

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