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    • China Silicon Nitride susbstrate Manufacturer, Supplier, Factory

    As a professional Silicon Nitride susbstrate manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Silicon Nitride susbstrate made in China, you can leave us a message.

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    • Semiconductor Fused Quartz Ring

      Semiconductor Fused Quartz Ring

      VeTeksemi's semiconductor fused quartz ring is an indispensable core component in the semiconductor etching process, with excellent purity, extremely high thermal stability and outstanding chemical resistance.Welcome your further inquiry.
    • TaC Coated Deflector Ring

      TaC Coated Deflector Ring

      VeTek Semiconductor's TaC Coated Deflector Ring is a highly specialized component designed for SiC crystal growth processes. The TaC coating provides excellent high temperature resistance and chemical inertness to cope with the high temperatures and corrosive environments during crystal growth process. This ensures stable performance and long life of the component, reducing the frequency of replacement and downtime. We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
    • Wafer Chuck

      Wafer Chuck

      Vetek Semiconductor's wafer chuck play pivotal roles in semiconductor production, enabling fast, high-quality output. With in-house manufacturing, competitive pricing, and robust R&D support, Vetek Semiconductor excels in OEM/ODM services for precision components.Looking forward to your inquiry.
    • CVD TaC Coating Crucible

      CVD TaC Coating Crucible

      VeTek Semiconductor is a professional manufacturer and leader of CVD TaC Coating Crucible products in China. CVD TaC Coating Crucible is based on tantalum carbon (TaC) coating. The tantalum carbon coating is evenly covered on the surface of the crucible through chemical vapor deposition (CVD) process to enhance its heat resistance and corrosion resistance. It is a material tool specially used in high temperature extreme environments. Welcome your further consultation.
    • Chemical Vapor Deposition Process Solid SiC Edge Ring

      Chemical Vapor Deposition Process Solid SiC Edge Ring

      VeTek Semiconductor is a leading Chemical Vapor Deposition Process Solid SiC Edge Ring manufacturer and innovator in China.We have been specialized in semiconductor material for many years.VeTek Semiconductor solid SiC edge ring offers improved etching uniformity and precise wafer positioning when used with an electrostatic chuck, ensuring consistent and reliable etching results.We look forward to becoming your long-term partner in China.
    • Si EPI Susceptor

      Si EPI Susceptor

      VeTek Semiconductor is a factory that combines precision machining and semiconductor SiC and TaC coating capabilities. The barrel type Si Epi Susceptor provides temperature and atmosphere control capabilities, enhancing production efficiency in semiconductor epitaxial growth processes.Looking forward to setting up cooperation relationship with you.
    • Related Blog
    • Reviews

    • How to prepare CVD TaC coating?

      This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.

    • Thermal Field Design for SiC Single Crystal Growth

      With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

    • How much do you know about CVD SiC ?

      CVD SiC is a high-purity silicon carbide material manufactured by chemical vapor deposition. It is mainly used for various components and coatings in semiconductor processing equipment. The following content is an introduction to the product classification and core functions of CVD SiC

    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

    • Application of carbon-based thermal field materials in silicon carbide crystal growth

      Silicon carbide (SiC)'s Key growth methods include PVT, TSSG, and HTCVD, each with distinct advantages and challenges. Carbon-based thermal field materials like insulation systems, crucibles, TaC coatings, and porous graphite enhance crystal growth by providing stability, thermal conductivity, and purity, essential for SiC's precise fabrication and application.

    • Italy's LPE's 200mm SiC epitaxial technology progress

      This article introduces the latest developments in the newly designed PE1O8 hot-wall CVD reactor of the Italian company LPE and its ability to perform uniform 4H-SiC epitaxy on 200mm SiC.

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