Semiconductor Quartz Bell Jar

Vetek Semiconductor Quartz Bell Jar plays multiple key roles in semiconductor processing. Quartz Bell Jar not only provides a stable and controlled reaction environment, but also ensures the efficiency and precision of various processes through its excellent thermal stability, chemical inertness and optical transparency. These characteristics also determine that Quartz Bell Jar is an indispensable component product in the semiconductor manufacturing process.

Vetek Semiconductor Quartz Bell Jar creates a sealed processing environment that enables process gases to be evenly distributed and react with the wafer surface under controlled conditions. Therefore, Semiconductor Quartz Bell Jar is usually used in processes such as CVD, diffusion and oxidation to accurately control the atmosphere composition and pressure, thereby ensuring the uniformity of the film and the purity of the material.

At the same time, quartz materials have excellent thermal stability, high temperature resistance (the high temperature environment in semiconductor processing is usually as high as 1000°C or more), and product characteristics of maintaining stable shape and size during heating and cooling. This determines that the Quartz Bell Jar can fully ensure the uniformity of the wafer surface temperature in the high temperature environment of diffusion and oxidation, thereby improving the quality and uniformity of the deposited or diffused layer.

More importantly, Vetek Semiconductor Quartz Bell Jar is not easy to react with process gases in high temperature environments and has strong corrosion resistance. This product characteristic determines that in processes using corrosive gases (such as some CVD processes), Semiconductor Quartz Bell Jar can fully maintain chemical stability, thereby avoiding contamination of semiconductor devices.

VeTek Semiconductor Quartz Bell Jar:

Overview of the semiconductor chip epitaxy industry chain: