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  • Sapphire Crystal Growth rigid felt

    • China Sapphire Crystal Growth rigid felt Manufacturer, Supplier, Factory

    As a professional Sapphire Crystal Growth rigid felt manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Sapphire Crystal Growth rigid felt made in China, you can leave us a message.

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    • Porous SiC Ceramic Chuck

      Porous SiC Ceramic Chuck

      Vetek Semiconductor offers Porous SiC Ceramic Chuck widely used in wafer processing technology, transfer and other links, suitable for bonding, scribing, patch, polishing and other links, laser processing. Our Porous SiC Ceramic Chuck has Ultra-strong vacuum adsorption, high flatness and high purity meet the needs of most semiconductor industries.Welcome to inquiry us.
    • CVD SiC coating ring

      CVD SiC coating ring

      The CVD SiC coating ring is one of the important parts of the halfmoon parts. Together with other parts, it forms the SiC epitaxial growth reaction chamber. VeTek Semiconductor is a professional CVD SiC coating ring manufacturer and supplier. According to the customer's design requirements, we can provide the corresponding CVD SiC coating ring at the most competitive price. VeTek Semiconductor looks forward to becoming your long-term partner in China.
    • Porous Graphite with TaC Coated

      Porous Graphite with TaC Coated

      Porous Graphite with TaC Coated is an advanced semiconductor processing material provided by VeTek Semiconductor. Porous Graphite with TaC Coated combines the advantages of porous graphite and tantalum carbide (TaC) coating, with good thermal conductivity and gas permeability. VeTek Semiconductor is committed to providing quality products at competitive prices, and we look forward to being your long-term partner in China.
    • SiC Ceramic Seal Ring

      SiC Ceramic Seal Ring

      As a large-scale factory and supplier of SiC Ceramic Seal Ring products in China, VeTek Semiconductor SiC Ceramic Seal Ring has a wide range of applications in the industrial field due to its excellent thermal conductivity, outstanding chemical and corrosion resistance, and high strength and stiffness. Welcome your further inquiries.
    • SiC Coated Graphite Susceptor for MOCVD

      SiC Coated Graphite Susceptor for MOCVD

      VeTek Semiconductor is a leading manufacturer and supplier of SiC Coated Graphite Susceptor for MOCVD in China, specializing in SiC coating applications and epitaxial semiconductor products for the semiconductor industry. Our MOCVD SiC coated graphite susceptors offer competitive quality and pricing, serving markets across Europe and America. We are committed to becoming your long-term, trusted partner in advancing semiconductor manufacturing.
    • SiC Coating Wafer Carrier

      SiC Coating Wafer Carrier

      As a professional SiC coating wafer carrier manufacturer and supplier in China, Vetek Semiconductor's SiC coating wafer carriers are mainly used to improve the growth uniformity of epitaxial layer, ensuring their stability and integrity in high temperature and corrosive environments. Looking forward to your inquiry.
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    • ALD Atomic Layer Deposition Recipe

      Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.

    • Italy's LPE's 200mm SiC epitaxial technology progress

      This article introduces the latest developments in the newly designed PE1O8 hot-wall CVD reactor of the Italian company LPE and its ability to perform uniform 4H-SiC epitaxy on 200mm SiC.

    • A complete explanation of the chip manufacturing process (1/2): from wafer to packaging and testing

      The semiconductor manufacturing process involves eight steps: wafer processing, oxidation, lithography, etching, thin film deposition, interconnection, testing, and packaging. Silicon from sand is processed into wafers, oxidized, patterned, and etched for high-precision circuits.

    • Based on 8-inch silicon carbide single crystal growth furnace technology

      Silicon carbide is one of the ideal materials for making high-temperature, high-frequency, high-power and high-voltage devices. In order to improve production efficiency and reduce costs, the preparation of large-size silicon carbide substrates is an important development direction.

    • The Problems in the Etching Process

      Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

    • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

      SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

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