Tantalum Carbide Ring
  • Tantalum Carbide RingTantalum Carbide Ring

Tantalum Carbide Ring

As an advanced manufacturer and producer of Tantalum Carbide Ring products in China, VeTek Semiconductor Tantalum Carbide Ring has extremely high hardness, wear resistance, high temperature resistance and chemical stability, and is widely used in the semiconductor manufacturing field. Especially in CVD, PVD, ion implantation process, etching process, and wafer processing and transportation, it is an indispensable product for semiconductor processing and manufacturing. Looking forward to your further consultation.

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Product Description

VeTek Semiconductor's Tantalum Carbide (TaC) Ring uses high-quality graphite as the core material and, thanks to its unique structure, is able to maintain its shape and mechanical properties under the extreme conditions of a crystal growth furnace. Graphite's high heat resistance gives it excellent stability throughout the crystal growth process.


The outer layer of the TaC Ring is covered with a tantalum carbide coating, a material known for its extremely high hardness, melting point of over 3880°C, and excellent resistance to chemical corrosion, making it especially suitable for high-temperature operating environments. The tantalum carbide coating provides a strong barrier to effectively prevent violent chemical reactions and ensure that the graphite core is not corroded by high-temperature furnace gases.


During silicon carbide (SiC) crystal growth, stable and uniform growth conditions are key to ensuring high-quality crystals. Tantalum Carbide Coating Ring plays a vital role in regulating gas flow and optimizing temperature distribution within the furnace. As a gas guide ring, the TaC Ring ensures uniform distribution of heat energy and reaction gases, ensuring uniform growth and stability of SiC crystals.


In addition, the high thermal conductivity of graphite combined with the protective effect of Tantalum Carbide Coated enables the TaC Guide Ring to operate stably in the high-temperature environment required for SiC crystal growth. Its structural strength and dimensional stability are crucial to maintaining conditions in the furnace, which directly affects the quality of the crystals produced. By reducing thermal fluctuations and chemical reactions within the furnace, TaC Coating Ring helps generate crystals with excellent electronic properties for high-performance semiconductor applications.


VeTek Semiconductor's Tantalum Carbide Ring is a key component of silicon carbide crystal growth furnaces and stands out for its excellent durability, thermal stability and chemical resistance. Its unique combination of graphite core and TaC coating allows it to maintain structural integrity and functionality under harsh conditions. By precisely controlling the temperature and gas flow within the furnace, the TaC Coating Ring provides the necessary conditions for the production of high-quality SiC crystals, which are critical for cutting-edge semiconductor component production.


Tantalum carbide (TaC) coating on a microscopic cross-section

Tantalum carbide (TaC) coating on a microscopic cross-section 1Tantalum carbide (TaC) coating on a microscopic cross-section 2Tantalum carbide (TaC) coating on a microscopic cross-section 3Tantalum carbide (TaC) coating on a microscopic cross-section 4



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