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SiC Coated Pancake Susceptor for LPE PE3061S 6'' Wafers
  • SiC Coated Pancake Susceptor for LPE PE3061S 6'' WafersSiC Coated Pancake Susceptor for LPE PE3061S 6'' Wafers
  • SiC Coated Pancake Susceptor for LPE PE3061S 6'' WafersSiC Coated Pancake Susceptor for LPE PE3061S 6'' Wafers

SiC Coated Pancake Susceptor for LPE PE3061S 6'' Wafers

VeTek Semiconductor is a leading SiC Coated Pancake Susceptor for LPE PE3061S 6'' wafers manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a SiC-coated pancake susceptor designed specifically for LPE PE3061S 6” wafers. This epitaxial susceptor features high corrosion resistance, good heat conduction performance, good uniformity.We welcome you to visit our factory in China.

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Product Description

As the professional manufacturer, VeTek Semiconductor would like to provide you high quality SiC Coated Pancake Susceptor for LPE PE3061S 6'' wafers.

The VeTeK Semiconductor SiC Coated Pancake Susceptor for LPE PE3061S 6" wafers is a critical equipment used in semiconductor manufacturing processes.


SiC Coated Pancake Susceptor for LPE PE3061S 6" wafers Product Features:

High-temperature stability: SiC exhibits excellent high-temperature stability, maintaining its structure and performance in high-temperature environments.

Outstanding thermal conductivity: SiC has exceptional thermal conductivity, enabling rapid and uniform heat transfer for fast and even heating.

Corrosion resistance: SiC possesses excellent chemical stability, resisting corrosion and oxidation in various heating environments.

Uniform heating distribution: SiC-coated wafer carrier provides uniform heating distribution, ensuring even temperature across the surface of the wafer during heating.

Suitable for semiconductor production: Si epitaxy wafer carrier is widely used in semiconductor manufacturing processes, particularly for Si epitaxy growth and other high-temperature heating processes.


Product Advantages:

Improved production efficiency: SiC-coated pancake susceptor enables fast and uniform heating, reducing heating time and enhancing production efficiency.

Ensured product quality: Uniform heating distribution ensures consistency during wafer processing, leading to improved product quality.

Extended equipment lifespan: SiC material offers excellent heat resistance and chemical stability, contributing to a longer lifespan of the pancake susceptor.

Customized solutions: SiC-coated susceptor, Si epitaxy wafer carrier can be tailored to different sizes and specifications based on customer requirements.



Basic physical properties of CVD SiC coating:

Basic physical properties of CVD SiC coating
Property Typical Value
Crystal Structure FCC β phase polycrystalline, mainly (111) oriented
Density 3.21 g/cm³
Hardness 2500 Vickers hardness(500g load)
Grain SiZe 2~10μm
Chemical Purity 99.99995%
Heat Capacity 640 J·kg-1·K-1
Sublimation Temperature 2700℃
Flexural Strength 415 MPa RT 4-point
Young' s Modulus 430 Gpa 4pt bend, 1300℃
Thermal Conductivity 300W·m-1·K-1
Thermal Expansion(CTE) 4.5×10-6K-1


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Overview of the semiconductor chip epitaxy industry chain:


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