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    • China Graphite support rod Manufacturer, Supplier, Factory

    As a professional Graphite support rod manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Graphite support rod made in China, you can leave us a message.

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    • 4H Semi Insulating Type SiC Substrate

      4H Semi Insulating Type SiC Substrate

      Vetek Semiconductor is a professional 4H Semi Insulating Type SiC Substrate manufacturer and supplier in China. Our 4H Semi Insulating Type SiC Substrate is widely used in key components of semiconductor manufacturing equipment. Vetek Semiconductor is committed to providing advanced 4H Semi Insulating Type SiC product solutions for the semiconductor industry. Welcome your further inquiries.
    • Ultra Pure Graphite Lower Halfmoon

      Ultra Pure Graphite Lower Halfmoon

      VeTek Semiconductor is a leading supplier of customized Ultra Pure Graphite Lower Halfmoon in China, specializing in advanced materials for many years. Our Ultra Pure Graphite Lower Halfmoon is specifically designed for SiC epitaxial equipment, ensuring excellent performance. Made from ultra-pure imported graphite, it offers reliability and durability. Visit our factory in China to explore our high-quality Ultra Pure Graphite Lower Halfmoon firsthand.
    • Physical Vapor Deposition

      Physical Vapor Deposition

      Vetek semiconductor Physical Vapor Deposition (PVD) is an advanced process technology widely used in surface treatment and thin film preparation. PVD technology uses physical methods to directly transform materials from solid or liquid to gas and form a thin film on the surface of the target substrate. This technology has the advantages of high precision, high uniformity and strong adhesion, and is widely used in semiconductors, optical devices, tool coatings and decorative coatings. Welcome to discuss with us!
    • Wafer Handling Robotic Arm

      Wafer Handling Robotic Arm

      Vetek Semiconductor thermal spraying technology plays a vital role in the application of wafer handling robotic arms, especially in semiconductor manufacturing environments that require high precision and high cleanliness. This technology significantly improves the durability, reliability and work efficiency of the equipment by coating special materials on the surface of the wafer handling robotic arm. Welcome to inquiry us.
    • Vertical Column Wafer Boat & Pedestal

      Vertical Column Wafer Boat & Pedestal

      As a professional Vertical Column Wafer Boat & Pedestal manufacturer and supplier in China, Vetek Semiconductor's Vertical Column Wafer Boat & Pedestal is made of high-purity quartz or silicon carbon ceramic (SiC) materials, with excellent high temperature resistance, chemical stability and mechanical strength, and is an indispensable core component in the semiconductor manufacturing process. Welcome to your further consultation.
    • SiC Coated Support for LPE PE2061S

      SiC Coated Support for LPE PE2061S

      VeTek Semiconductor is a leading SiC Coated Support for LPE PE2061S manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a SiC Coated Support for LPE PE2061S designed specifically for LPE silicon epitaxy reactor. This SiC Coated Support for LPE PE2061S is the bottom of barrel susceptor.It can withstand 1600 degrees Celsius high temperature, extend product life of graphite spare part.Welcome to send us inquiry.
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      Diamond, a potential fourth-generation "ultimate semiconductor," is gaining attention in semiconductor substrates due to its exceptional hardness, thermal conductivity, and electrical properties. While its high cost and production challenges limit its use, CVD is the preferred method. Despite doping and large-area crystal challenges, diamond holds promise.

    • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

      The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

    • Do you know about MOCVD Susceptor?

      This article mainly introduces the product types, product characteristics and main functions of MOCVD Susceptor in semiconductor processing, and makes a comprehensive analysis and interpretation of MOCVD Susceptor products as a whole.

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      CVD SiC is a high-purity silicon carbide material manufactured by chemical vapor deposition. It is mainly used for various components and coatings in semiconductor processing equipment. The following content is an introduction to the product classification and core functions of CVD SiC

    • Application of TaC-Coated Graphite Parts in Single Crystal Furnaces

      In the growth of SiC and AlN single crystals using the physical vapor transport (PVT) method, crucial components such as the crucible, seed holder, and guide ring play a vital role. As depicted in Figure 2 [1], during the PVT process, the seed crystal is positioned in the lower temperature region, while the SiC raw material is exposed to higher temperatures (above 2400 ℃).

    • Silicon(Si) epitaxy preparation technology

      Single crystal materials alone cannot meet the needs of the growing production of various semiconductor devices. At the end of 1959, a thin layer of single crystal material growth technology - epitaxial growth was developed.

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