VeTek Semiconductor Silicon Pedestal is a key component in semiconductor diffusion and oxidation processes. As a dedicated platform for carrying silicon boats in high-temperature furnaces, the Silicon Pedestal has many unique advantages, including improved temperature uniformity, optimized wafer quality, and enhanced performance of semiconductor devices. For more product information, please feel free to contact us.
VeTek Semiconductor silicon susceptor is a pure silicon product designed to ensure temperature stability in the thermal reactor tube during silicon wafer processing, thereby improving thermal insulation efficiency. Silicon wafer processing is an extremely precise process, and temperature plays a crucial role, directly affecting the thickness and uniformity of the silicon wafer film.
The silicon Pedestal is located in the lower part of the furnace thermal reactor tube, supporting the silicon wafer carrier while providing effective thermal insulation. At the end of the process, it gradually cools down to ambient temperature together with the silicon wafer carrier.
Provide stable support to ensure process accuracy
The silicon Pedestal provides a stable and highly heat-resistant support platform for the silicon boat in the high-temperature furnace chamber. This stability can effectively prevent the silicon boat from shifting or tilting during processing, thereby avoiding affecting the uniformity of airflow or destroying temperature distribution, ensuring high precision and consistency of the process.
Enhance temperature uniformity in the furnace and improve wafer quality
By isolating the silicon boat from direct contact with the furnace bottom or wall, the silicon base can reduce heat loss caused by conduction, thereby achieving a more uniform temperature distribution in the thermal reaction tube. This uniform thermal environment is essential to achieve uniformity of wafer diffusion and oxide layer, greatly improving the overall quality of the wafer.
Optimize thermal insulation performance and reduce energy consumption
The excellent thermal insulation properties of the silicon base material help reduce heat loss in the furnace chamber, thereby significantly improving the energy efficiency of the process. This efficient thermal management mechanism not only speeds up the cycle of heating and cooling, but also reduces energy consumption and operating costs, providing a more economical solution for semiconductor manufacturing.
Product Structure |
Integrated, Welding |
Conductive Type/Doping |
Custom |
Resistivity |
Low Resistance (E.G.<0.015,<0.02...). ; |
Moderate Resistance (E.G.1-4); |
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High Resistance (E.G. 60-90); |
|
Customer Customization |
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Material Type |
Polycrystal/Single Crystal |
Crystal Orientation |
Customized |