Porous Ceramic Vacuum Chuck

As a professional Porous Ceramic Vacuum Chuck manufacturer and supplier in China, Vetek Semiconductor's Porous Ceramic Vacuum Chuck is made of silicon carbide ceramic (SiC) material, which has excellent high temperature resistance, chemical stability and mechanical strength. It is an indispensable core component in the semiconductor manufacturing process. Welcome your further inquiries.

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Product Description

Vetek Semiconductor is a Chinese manufacturer of Porous Ceramic Vacuum Chuck, which is used to fix and hold silicon wafers or other substrates by vacuum adsorption to ensure that these materials will not shift or warp during processing. Vetek Semiconducto can provide high-purity Porous Ceramic Vacuum Chuck products with high cost performance. Welcome to inquire.

Vetek Semiconductor offers a series of excellent Porous Ceramic Vacuum Chuck products, specially designed to meet the stringent requirements of modern semiconductor manufacturing. These carriers show excellent performance in cleanliness, flatness and customizable gas path configuration.

Unparalleled cleanliness:

Impurity elimination: Each Porous Ceramic Vacuum Chuck is sintered at 1200°C for 1.5 hours to completely remove impurities and ensure that the surface is as clean as new.

Vacuum packaging: To maintain the clean state, Porous Ceramic Vacuum Chuck is vacuum packaged to prevent contamination during storage and transportation.

Excellent Flatness:

Solid Wafer Adsorption: The Porous Ceramic Vacuum Chuck maintains an adsorption force of -60kPa and -70kPa before and after wafer placement, respectively, ensuring that the wafer is firmly adsorbed and prevents it from falling off during high-speed transmission.

Precision Machining: The back of the carrier is precision machined to ensure a completely flat surface, thereby maintaining a stable vacuum seal and preventing leakage.

Customized Design:

Customer-centric: Vetek Semiconductor works closely with customers to design gas path configurations that meet their specific process requirements to optimize efficiency and performance.

Strict Quality Testing:

Vetek conducts comprehensive tests on each piece of Porous SiC Vacuum Chuck to ensure its quality:

Oxidation Test: The SiC Vacuum Chuck is quickly heated to 900°C in an oxygen-free environment to simulate the actual oxidation process. Prior to this, the carrier is annealed at 1100°C to ensure optimal performance.

Metal Residue Test: To prevent contamination, the carrier is heated at a high temperature of 1200°C to detect whether there are any metal impurities precipitated.

Vacuum test: By measuring the pressure difference between the Porous SiC Vacuum Chuck with and without the wafer, its vacuum sealing performance is strictly tested. The pressure difference must be controlled within ±2kPa.