How much do you know about CVD SiC ?

CVD SiC (Chemical Vapor Deposition Silicon Carbide) is a high-purity silicon carbide material manufactured by chemical vapor deposition. It is mainly used for various components and coatings in semiconductor processing equipment.CVD SiC material has excellent thermal stability, high hardness, low thermal expansion coefficient and excellent chemical corrosion resistance, making it an ideal material for use under extreme process conditions.

CVD SiC material is widely used in components involving high temperature, highly corrosive environment and high mechanical stress in the semiconductor manufacturing process, mainly including the following products:

CVD SiC Coating:

It is used as a protective layer for semiconductor processing equipment to prevent the substrate from being damaged by high temperature, chemical corrosion and mechanical wear.

SiC Wafer Boat:

It is used to carry and transport wafers in high-temperature processes (such as diffusion and epitaxial growth) to ensure the stability of wafers and the uniformity of processes.

SiC process tube:

SiC process tubes are mainly used in diffusion furnaces and oxidation furnaces to provide a controlled reaction environment for silicon wafers, ensuring precise material deposition and uniform doping distribution.

SiC Cantilever Paddle:

SiC Cantilever Paddle is mainly used to carry or support silicon wafers in diffusion furnaces and oxidation furnaces, playing a bearing role. Especially in high-temperature processes such as diffusion, oxidation, annealing, etc., it ensures the stability and uniform treatment of silicon wafers in extreme environments.

CVD SiC Shower Head:

It is used as a gas distribution component in plasma etching equipment, with excellent corrosion resistance and thermal stability to ensure uniform gas distribution and etching effect.

SiC Coated Ceiling:

Components in the equipment reaction chamber, used to protect the equipment from damage by high temperature and corrosive gases, and extend the service life of the equipment.

Silicon Epitaxy Susceptors:

Wafer carriers used in silicon epitaxial growth processes to ensure uniform heating and deposition quality of wafers.

Chemical vapor deposited silicon carbide (CVD SiC) has a wide range of applications in semiconductor processing, mainly used to manufacture devices and components that are resistant to high temperatures, corrosion, and high hardness. Its core role is reflected in the following aspects:

Protective coatings in high-temperature environments:

Function: CVD SiC is often used for surface coatings of key components in semiconductor equipment (such as suceptors, reaction chamber linings, etc.). These components need to work in high-temperature environments, and CVD SiC coatings can provide excellent thermal stability to protect the substrate from high-temperature damage.

Advantages: The high melting point and excellent thermal conductivity of CVD SiC ensure that the components can work stably for a long time under high temperature conditions, extending the service life of the equipment.

Anti-corrosion applications:

Function: In the semiconductor manufacturing process, CVD SiC coating can effectively resist the erosion of corrosive gases and chemicals and protect the integrity of equipment and devices. This is especially important for handling highly corrosive gases such as fluorides and chlorides.

Advantages: By depositing CVD SiC coating on the surface of the component, the equipment damage and maintenance costs caused by corrosion can be greatly reduced, and production efficiency can be improved.

High strength and wear-resistant applications:

Function: CVD SiC material is known for its high hardness and high mechanical strength. It is widely used in semiconductor components that require wear resistance and high precision, such as mechanical seals, load-bearing components, etc. These components are subjected to strong mechanical stress and friction during operation. CVD SiC can effectively resist these stresses and ensure the long life and stable performance of the device.

Advantages: Components made of CVD SiC can not only withstand mechanical stress in extreme environments, but also maintain their dimensional stability and surface finish after long-term use.

At the same time, CVD SiC plays a vital role in LED epitaxial growth, power semiconductors and other fields. In the semiconductor manufacturing process, CVD SiC substrates are usually used as EPI SUSCEPTORs. Their excellent thermal conductivity and chemical stability make the grown epitaxial layers have higher quality and consistency. In addition, CVD SiC is also widely used in PSS etching carriers, RTP wafer carriers, ICP etching carriers, etc., providing stable and reliable support during semiconductor etching to ensure device performance.

VeTek semiconductor Technology Co., LTD is a leading provider of advanced coating materials for the semiconductor industry. Our company focus on developing-edge solutions for the industry.

Our main product offerings include CVD silicon carbide (SiC) coatings, tantalum carbide (TaC) coatings, bulk SiC, SiC powders, and high-purity SiC materials, SiC coated graphite susceptor, preheat, TaC coated diversion ring, halfmoon, cutting parts etc., the purity is below 5ppm, cutting rings can meet customer requirements.

VeTek semiconductor focus on developing cutting-edge technology and product development solutions for the semiconductor industry. We sincerely hope to become your long-term partner in China.