English
Home > Products
  • CVD SiC coating Epi susceptor

    • China CVD SiC coating Epi susceptor Manufacturer, Supplier, Factory

    As a professional CVD SiC coating Epi susceptor manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable CVD SiC coating Epi susceptor made in China, you can leave us a message.

    Related Products

    Hot Products

    • VEECO MOCVD Susceptor

      VEECO MOCVD Susceptor

      As a leading manufacturer and supplier of VEECO MOCVD Susceptor products in China, VeTek Semiconductor's MOCVD Susceptor represents the pinnacle of innovation and engineering excellence, specially customized to meet the complex requirements of contemporary semiconductor manufacturing processes. Welcome your further inquiries.
    • Electric Fused Quartz

      Electric Fused Quartz

      Electric fused quartz is made of high-purity SiCl4 and melted by hydrogen-oxygen flame. The product is bubble-free. VeTek Semiconductor has mature electric fused quartz production capabilities and strong production capacity, and can provide corresponding electric fused quartz products according to customer needs. VeTek Semiconductor looks forward to your inquiry.
    • SiC Coating Cover Segments

      SiC Coating Cover Segments

      Vetek Semiconductor is dedicated to the advancement and commercialization of CVD SiC coating and CVD TaC coating. As an illustration, our SiC Coating Cover Segments undergoes meticulous processing, resulting in a dense CVD SiC coating with exceptional precision. It exhibits remarkable resistance to high temperatures and offers robust protection against corrosion. We welcome your inquiries.
    • CVD SiC Coated Wafer Barrel Holder

      CVD SiC Coated Wafer Barrel Holder

      CVD SiC coated wafer Barrel holder is the key component of epitaxial growth furnace, widely used in MOCVD epitaxial growth furnaces. VeTek Semiconductor provides you with highly customized products. No matter what your needs are for CVD SiC coated wafer Barrel holder, Welcome to consult us.
    • SiC Coated Barrel Susceptor for LPE PE2061S

      SiC Coated Barrel Susceptor for LPE PE2061S

      VeTek Semiconductor is a leading SiC Coated Barrel Susceptor for LPE PE2061S manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a SiC-coated barrel susceptor designed specifically for LPE PE2061S 4'' wafers. This susceptor features a durable silicon carbide coating that enhances performance and durability during the LPE (Liquid Phase Epitaxy) process.We welcome you to visit our factory in China.
    • ALD Susceptor

      ALD Susceptor

      VeTek Semiconductor is a professional manufacturer of ALD Susceptor, CVD SiC coating, CVD TAC COATING graphite base in China. Vetek Semiconductor jointly developed and produced SiC-coated ALD planetary bases with ALD system manufacturers to meet the high requirements of the ALD process and evenly distribute the air flow on the substrate. We look forward to further cooperation with you.
    • Related Blog
    • Reviews

    • Italy's LPE's 200mm SiC epitaxial technology progress

      This article introduces the latest developments in the newly designed PE1O8 hot-wall CVD reactor of the Italian company LPE and its ability to perform uniform 4H-SiC epitaxy on 200mm SiC.

    • Uses of solid silicon carbide

      Solid silicon carbide has excellent properties such as high temperature stability, high hardness, good abrasion resistance, and good chemical stability, so it has a wide range of applications. The following are some applications of solid silicon carbide:

    • Silicon(Si) epitaxy preparation technology

      Single crystal materials alone cannot meet the needs of the growing production of various semiconductor devices. At the end of 1959, a thin layer of single crystal material growth technology - epitaxial growth was developed.

    • What are the differences between MBE and MOCVD technologies?

      This article mainly discusses the respective process advantages and differences of Molecular Beam Epitaxy process and Metal-organic chemical vapour deposition technologies.

    • Diamond - the future star of semiconductors

      Diamond, a potential fourth-generation "ultimate semiconductor," is gaining attention in semiconductor substrates due to its exceptional hardness, thermal conductivity, and electrical properties. While its high cost and production challenges limit its use, CVD is the preferred method. Despite doping and large-area crystal challenges, diamond holds promise.

    • Characteristics of silicon epitaxy

      High purity: The silicon epitaxial layer grown by chemical vapor deposition (CVD) has extremely high purity, better surface flatness and lower defect density than traditional wafers.

    Send Inquiry

    Hit enter to search or ESC to close
    X
    We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
    Reject Accept