Vertical furnace SiC coated ring

Vertical furnace SiC coated ring is a component specially designed for Vertical furnace. VeTek Semiconductor can do the best for you in terms of both materials and manufacturing processes. As a leading manufacturer and supplier of Vertical furnace SiC coated ring in China, VeTek Semiconductor is confident that we can provide you with the best products and services.

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Product Description

In vertical furnaces, the use of SiC coated rings is a common solution, mainly used in high-temperature heat treatment processes of semiconductor wafers. Vertical furnace SiC coated rings are high-performance, high-temperature resistant components used to support or protect wafers to ensure the stability and reliability of the process.

The Functions of Vertical furnace SiC coated ring

● Functions

Supporting role. Used to support wafers to ensure their stability and accurate position in high-temperature furnaces.

● Corrosion protection

Prevent corrosive gases or chemicals from corroding the base material.

● Reduce pollution

High-purity SiC coating can effectively prevent particle shedding and impurity contamination to ensure process cleanliness.

● High temperature resistance

Maintain excellent mechanical properties and dimensional stability in high temperature environments (usually over 1000°C).

The Features of Vertical Furnace SiC coated ring

● High hardness and strength

SiC materials have excellent mechanical strength and can withstand high temperature stress in the furnace.

● Good thermal stability

SiC's high thermal conductivity and low thermal expansion coefficient help reduce thermal stress.

● Strong chemical stability

SiC coatings can resist corrosion in oxidizing, acidic or alkaline environments.

● Low particle contamination

The smooth surface reduces the possibility of particle generation, which is particularly suitable for the ultra-clean environment of semiconductor manufacturing.

Used for diffusion, oxidation, annealing and other processes in vertical furnaces to support silicon wafers and prevent particle contamination during heat treatment.

Manufacturing materials and processes

● Substrate: Made of high-quality SGL graphite, the quality is guaranteed.

● Coating: Silicon carbide coating is applied to the graphite surface by chemical vapor deposition (CVD).

● The coating thickness is usually between 50~500μm, which is adjusted according to the use requirements.

● The chemical vapor deposition SiC coating has higher purity and density, and better durability.

Select the appropriate SiC coating ring according to the diameter of the silicon wafer in the furnace and the carrier specifications. We can customize it for you. High purity, dense coating is more durable and less polluting.Regularly replace according to the frequency of use and process requirements to avoid contamination or support failure due to coating aging.

As a professional Vertical Furnace SiC coated ring supplier and manufacturer in China, VeTek Semiconductor has long been committed to providing advanced Vertical Furnace technology and product solutions for the semiconductor industry. We sincerely look forward to becoming your long-term partner in China.

CVD SIC FILM CRYSTAL STRUCTURE

Basic physical properties of CVD SiC coating

Basic physical properties of CVD SiC Coating
Property	Typical Value
Crystal Structure	FCC β phase polycrystalline, mainly (111) oriented
SiC Coating Density	3.21 g/cm³
SiC Coating Hardness	2500 Vickers hardness（500g load）
Grain SiZe	2~10μm
Chemical Purity	99.99995%
Heat Capacity	640 J·kg^-1·K^-1
Sublimation Temperature	2700℃
Flexural Strength	415 MPa RT 4-point
Young' s Modulus	430 Gpa 4pt bend, 1300℃
Thermal Conductivity	300W·m^-1·K^-1
Thermal Expansion(CTE)	4.5×10^-6K^-1