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  • VEECO GaN Epitaxy

    • China VEECO GaN Epitaxy Manufacturer, Supplier, Factory

    As a professional VEECO GaN Epitaxy manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable VEECO GaN Epitaxy made in China, you can leave us a message.

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    • CVD TAC Coating

      CVD TAC Coating

      VeTek Semiconductor is a leading manufacturer, innovator and leader of CVD TAC Coating in China. For many years, we have been focusing on various CVD TAC Coating products such as CVD TaC coating cover, CVD TaC Coating Ring, CVD TaC Coating carrier, etc. VeTek Semiconductor supports customized product services and satisfactory product prices, and looks forward to your further consultation.
    • SiC Coating Wafer Carrier

      SiC Coating Wafer Carrier

      As a professional SiC coating wafer carrier manufacturer and supplier in China, Vetek Semiconductor's SiC coating wafer carriers are mainly used to improve the growth uniformity of epitaxial layer, ensuring their stability and integrity in high temperature and corrosive environments. Looking forward to your inquiry.
    • CVD SiC Coated Ceiling

      CVD SiC Coated Ceiling

      As a professional CVD SiC coated ceiling manufacturer and supplier in China, VeTek Semiconductor's CVD SiC coated ceiling has excellent properties such as high temperature resistance, corrosion resistance, high hardness, and low thermal expansion coefficient, making it an ideal material choice in semiconductor manufacturing. We look forward to further cooperation with you.
    • TaC Coating Tube

      TaC Coating Tube

      As a professional TaC Coating Tube manufacturer and supplier in China, VeTek Semiconductor's TaC coating tube is a key component for the successful growth of silicon carbide single crystals. With its high temperature resistance, chemical inertness and excellent performance, it ensures the production of high-quality crystals with consistent results. Trust our innovative solutions to enhance your PVT method SiC crystal growth process and achieve excellent results.Welcome to inquiry us.
    • Porous Tantalum Carbide

      Porous Tantalum Carbide

      VeTek Semiconductor is a professional manufacturer and leader of Porous Tantalum Carbide products in China. Porous Tantalum Carbide is usually manufactured by chemical vapor deposition (CVD) method, ensuring precise control of its pore size and distribution, and is a material tool dedicated to high temperature extreme environments. Welcome your further consultation.
    • CVD SiC Coated Skirt

      CVD SiC Coated Skirt

      VeTek Semiconductor is a leading manufacturer, innovator and leader of CVD SiC Coating and TAC Coating in China. For many years, we have been focusing on various CVD SiC Coating products such as CVD SiC coated Skirt, CVD SiC Coating Ring, CVD SiC Coating carrier, etc. VeTek Semiconductor supports customized product services and satisfactory product prices, and looks forward to your further consultation.
    • Related Blog
    • Reviews

    • What’s the specific application of TaC coated parts in the semiconductor field?

      Tantalum carbide (TaC) coatings are widely used in the semiconductor field, mainly for epitaxial growth reactor components, single crystal growth key components, high-temperature industrial components, MOCVD system heaters and wafer carriers.Its excellent high temperature resistance and corrosion resistance can improve equipment durability, yield and crystal quality, reduce energy consumption and improve stability.

    • Application of carbon-based thermal field materials in silicon carbide crystal growth

      Silicon carbide (SiC)'s Key growth methods include PVT, TSSG, and HTCVD, each with distinct advantages and challenges. Carbon-based thermal field materials like insulation systems, crucibles, TaC coatings, and porous graphite enhance crystal growth by providing stability, thermal conductivity, and purity, essential for SiC's precise fabrication and application.

    • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

      The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

    • Silicon(Si) epitaxy preparation technology

      Single crystal materials alone cannot meet the needs of the growing production of various semiconductor devices. At the end of 1959, a thin layer of single crystal material growth technology - epitaxial growth was developed.

    • Chinese companies are reportedly developing 5nm chips with Broadcom!

      According to overseas news, two sources revealed on June 24 that ByteDance is working with US chip design company Broadcom to develop an advanced artificial intelligence (AI) computing processor, which will help ByteDance ensure an adequate supply of high-end chips amid tensions between China and the United States.

    • Diamond - the future star of semiconductors

      Diamond, a potential fourth-generation "ultimate semiconductor," is gaining attention in semiconductor substrates due to its exceptional hardness, thermal conductivity, and electrical properties. While its high cost and production challenges limit its use, CVD is the preferred method. Despite doping and large-area crystal challenges, diamond holds promise.

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