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    • China Silicon Carbide Epitaxy Manufacturer, Supplier, Factory

    As a professional Silicon Carbide Epitaxy manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Silicon Carbide Epitaxy made in China, you can leave us a message.

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    • CVD SiC Block for SiC Crystal Growth

      CVD SiC Block for SiC Crystal Growth

      VeTek Semiconductor focuses on the research and development and industrialization of CVD-SiC bulk sources, CVD SiC coatings, and CVD TaC coatings. Taking CVD SiC block for SiC Crystal Growth as an example, the product processing technology is advanced, the growth rate is fast, high temperature resistance, and corrosion resistance are strong. Welcome to inquire.
    • TaC Coating Planetary Susceptor

      TaC Coating Planetary Susceptor

      VeTek Semiconductor'TaC Coating Planetary Susceptor is an exceptional product for Aixtron epitaxy equipment. The robust TaC coating provides excellent high-temperature resistance and chemical inertness. This unique combination ensures reliable performance and long service life, even in demanding environments. VeTek is committed to providing high-quality products and serving as a long-term partner in the Chinese market with competitive pricing.
    • CVD SiC Coating Protector

      CVD SiC Coating Protector

      Vetek Semiconductor provides CVD SiC Coating Protector used is LPE SiC epitaxy, The term "LPE" usually refers to Low Pressure Epitaxy (LPE) in Low Pressure Chemical Vapor Deposition (LPCVD). In semiconductor manufacturing, LPE is an important process technology for growing single crystal thin films, often used to grow silicon epitaxial layers or other semiconductor epitaxial layers.Pls no hesitate to contact us for more questions.
    • PyC Coating Rigid Felt Ring

      PyC Coating Rigid Felt Ring

      VeTek Semiconductor is a leading manufacturer of customized PyC Coating Rigid Felt Ring in China, specializing in advanced materials for many years. Our PyC Coating Rigid Felt Ring have dense surface and high purity. With 2 laboratories and 12 production lines, thousand-grade and hundred-grade production workshops in our factory, welcome to visit us.
    • SiC Coated Epi Susceptor

      SiC Coated Epi Susceptor

      As the top domestic manufacturer of silicon carbide and tantalum carbide coatings, VeTek Semiconductor is able to provide precision machining and uniform coating of SiC Coated Epi Susceptor, effectively controlling the purity of coating and product below 5ppm. The product life is comparable to that of SGL. Welcome to inquire us.
    • Monocrystalline pulling Crucible

      Monocrystalline pulling Crucible

      Vetek Semiconductor recognizes the vital importance of Monocrystalline Pulling Crucibles in the process of achieving monocrystalline silicon ingot growth, a fundamental step in semiconductor device manufacturing. Our crucibles are intricately engineered to meet the rigorous requirements set by the semiconductor industry. Vetek Semiconductor is committed to producing and supplying crystal growth graphite crucibles that excel in performance, quality, and cost-effectiveness to meet the evolving needs of the industry.Welcome to inquiry us.
    • Related Blog
    • Reviews

    • Principles and Technology of Physical Vapor Deposition (PVD) Coating (2/2) - VeTek Semiconductor

      Electron beam evaporation is a highly efficient and widely used coating method compared to resistance heating, which heats the evaporation material with an electron beam, causing it to vaporize and condense into a thin film.

    • How much do you know about CVD SiC ?

      CVD SiC is a high-purity silicon carbide material manufactured by chemical vapor deposition. It is mainly used for various components and coatings in semiconductor processing equipment. The following content is an introduction to the product classification and core functions of CVD SiC

    • ALD Atomic Layer Deposition Recipe

      Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.

    • Thermal Field Design for SiC Single Crystal Growth

      With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

    • Tantalum carbide technology breakthrough, SiC epitaxial pollution reduced by 75%?

      Recently, the German research institute Fraunhofer IISB has made a breakthrough in the research and development of tantalum carbide coating technology, and developed a spray coating solution that is more flexible and environmentally friendly than the CVD deposition solution, and has been commercialized.

    • The Development History of 3C SiC

      Through continuous technological progress and in-depth mechanism research, 3C-SiC heteroepitaxial technology is expected to play a more important role in the semiconductor industry and promote the development of high-efficiency electronic devices.

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    Aixtron Silicon Carbide EpitaxySilicon Carbide Epitaxy SusceptorSilicon Carbide Epitaxy Wafer Carrier

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