Tantalum Carbide Coated Cover

VeTek Semiconductor is a leading Tantalum Carbide Coated Cover manufacturer and innovator in China.We have been specialized in TaC and SiC coating for many years.Our products have a corrosion resistance, high strength. We look forward to becoming your long-term partner in China.

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Product Description

Find a huge selection of Tantalum Carbide Coated Cover from China at VeTek Semiconductor. Provide professional after-sales service and the right price, looking forward to cooperation.The Tantalum Carbide Coated Cover developed by VeTek Semiconductor is an accessory specifically designed for the AIXTRON G10 MOCVD system, aiming to optimize efficiency and enhance semiconductor manufacturing quality. It is meticulously crafted using high-quality materials and manufactured with utmost precision, ensuring outstanding performance and reliability for Metal-Organic Chemical Vapor Deposition (MOCVD) processes.

Constructed with a graphite substrate coated with Chemical Vapor Deposition (CVD) Tantalum Carbide (TaC), Tantalum Carbide Coated Cover offers exceptional thermal stability, high purity, and resistance to elevated temperatures. This unique combination of materials provides a reliable solution for the demanding operational conditions of the MOCVD system.

The Tantalum Carbide Coated Cover is customizable to accommodate various semiconductor wafer sizes, making it suitable for diverse production requirements. Its robust construction is specifically engineered to withstand the challenging MOCVD environment, ensuring long-lasting performance and minimizing downtime and maintenance costs associated with wafer carriers and susceptors.

By incorporating the TaC cover into the AIXTRON G10 MOCVD system, semiconductor manufacturers can achieve higher efficiency and superior results. The exceptional thermal stability, compatibility with different wafer sizes, and reliable performance of the Planetary Disk make it an indispensable tool for optimizing production efficiency and attaining outstanding outcomes in the MOCVD process.

Product parameter of the Tantalum Carbide Coated Cover

Physical properties of TaC coating
Density	14.3 (g/cm³)
Specific emissivity	0.3
Thermal expansion coefficient	6.3 10-6/K
Hardness (HK)	2000 HK
Resistance	1×10-5 Ohm*cm
Thermal stability	<2500℃
Graphite size changes	-10~-20um
Coating thickness	≥20um typical value (35um±10um)