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  • Silicon Carbide Epitaxy Susceptor

    • China Silicon Carbide Epitaxy Susceptor Manufacturer, Supplier, Factory

    As a professional Silicon Carbide Epitaxy Susceptor manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Silicon Carbide Epitaxy Susceptor made in China, you can leave us a message.

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    • SiC Coating Inlet Ring

      SiC Coating Inlet Ring

      Vetek Semiconductor excels in collaborating closely with clients to craft bespoke designs for SiC Coating Inlet Ring tailored to specific needs. These SiC Coating Inlet Ring are meticulously engineered for diverse applications such as CVD SiC equipment and Silicon carbide epitaxy. For tailored SiC Coating Inlet Ring solutions, do not hesitate to reach out to Vetek Semiconductor for personalized assistance.
    • Thermal spraying technology MLCC capacitor

      Thermal spraying technology MLCC capacitor

      Vetek Semiconductor thermal spraying technology plays an extremely important role in the coating application of sintered crucibles for high-end multilayer ceramic capacitor (MLCC) materials. With the continuous miniaturization and high performance of electronic devices, the demand for thermal spraying technology MLCC capacitors is also growing rapidly, especially in high-end applications. In order to meet this demand, the crucibles used in the sintering process must have excellent high temperature resistance, corrosion resistance and good thermal conductivity, all of which can be achieved and improved by thermal spraying technology. Looking forward to setting up long term business with you.
    • SiC Coating Collector Top

      SiC Coating Collector Top

      Welcome to VeTek Semiconductor, your trusted manufacturer of CVD SiC coatings. We take pride in offering Aixtron SiC Coating Collector Top, which are expertly engineered using high purity graphite and feature a state-of-the-art CVD SiC coating with impurity below 5ppm. Please don't hesitate to reach out to us with any questions or inquiries
    • MOCVD Epitaxial Susceptor for 4

      MOCVD Epitaxial Susceptor for 4" Wafer

      VeTek Semiconductor is a professional manufacturer and supplier, who is dedicated to providing high-quality MOCVD Epitaxial Susceptor for 4" Wafer. with rich industry experience and a professional team, we are able to deliver expert and efficient solutions to our clients.
    • SiC Coated Support Ring

      SiC Coated Support Ring

      VeTek Semiconductor is a professional China manufacturer and supplier, mainly producing SiC coated support rings, CVD silicon carbide (SiC) coatings, tantalum carbide (TaC) coatings, bulk SiC, SiC powders and high-purity SiC materials. We are committed to providing perfect technical support and ultimate product solutions for the semiconductor industry, welcome to contact us.
    • SiC Wafer Boat

      SiC Wafer Boat

      VeTek Semiconductor's SiC Wafer Boat is a very high performance product. Our SiC Wafer Boat is usually used in semiconductor oxidation diffusion furnaces to ensure that the temperature is evenly distributed on the wafer and improve the silicon wafer processing quality. The high temperature stability and high thermal conductivity of SiC materials ensure efficient and reliable semiconductor processing. We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
    • Related Blog
    • Reviews

    • Different technical routes of SiC epitaxial growth furnace

      Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

    • Italy's LPE's 200mm SiC epitaxial technology progress

      This article introduces the latest developments in the newly designed PE1O8 hot-wall CVD reactor of the Italian company LPE and its ability to perform uniform 4H-SiC epitaxy on 200mm SiC.

    • A complete explanation of the chip manufacturing process (1/2): from wafer to packaging and testing

      The semiconductor manufacturing process involves eight steps: wafer processing, oxidation, lithography, etching, thin film deposition, interconnection, testing, and packaging. Silicon from sand is processed into wafers, oxidized, patterned, and etched for high-precision circuits.

    • How to prepare CVD TaC coating?

      This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.

    • Sanan Optoelectronics Co., Ltd.: 8-inch SiC chips are expected to be put into production in December!

      As a leading manufacturer in the SiC industry, Sanan Optoelectronics' related dynamics have received widespread attention in the industry. Recently, Sanan Optoelectronics disclosed a series of latest developments, involving 8-inch transformation, new substrate factory production, establishment of new companies, government subsidies and other aspects.

    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

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