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China Silicon Carbide Epitaxy Wafer Carrier Manufacturer, Supplier, Factory

As a professional Silicon Carbide Epitaxy Wafer Carrier manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Silicon Carbide Epitaxy Wafer Carrier made in China, you can leave us a message.

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    CVD SiC coated wafer Barrel holder is the key component of epitaxial growth furnace, widely used in MOCVD epitaxial growth furnaces. VeTek Semiconductor provides you with highly customized products. No matter what your needs are for CVD SiC coated wafer Barrel holder, Welcome to consult us.
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    As an advanced manufacturer and producer of Tantalum Carbide Ring products in China, VeTek Semiconductor Tantalum Carbide Ring has extremely high hardness, wear resistance, high temperature resistance and chemical stability, and is widely used in the semiconductor manufacturing field. Especially in CVD, PVD, ion implantation process, etching process, and wafer processing and transportation, it is an indispensable product for semiconductor processing and manufacturing. Looking forward to your further consultation.
  • High purity Rigid felt tube

    High purity Rigid felt tube

    VeTek Semiconductor high purity rigid felt tubes are the first choice for high-temperature applications in the semiconductor industry. Their high compressive strength and excellent thermal insulation properties make them reliable and efficient components in the crystal growth process. VeTek Semiconductor has always been committed to providing advanced and reliable high-purity rigid felt tube technology and product solutions for the semiconductor industry. We welcome your further inquiries.
  • VEECO MOCVD Heater

    VEECO MOCVD Heater

    VeTek Semiconductor is a leading manufacturer and supplier of VEECO MOCVD heater products in China. MOCVD heater has excellent chemical purity, thermal stability and corrosion resistance. It is an indispensable product in the metal organic chemical vapor deposition (MOCVD) process. Welcome to your further inquiries.
  • Tantalum Carbide Coating Ring

    Tantalum Carbide Coating Ring

    VeTek semiconductor Tantalum Carbide Coating Ring is a indispensable component in the semiconductor industry, specifically in the etching of SiC wafers. Its combination of a graphite base and TaC coating ensures superior performance in high-temperature and chemically aggressive environments. With its enhanced thermal stability, corrosion resistance, and mechanical strength, the Tantalum Carbide Coated Ring helps semiconductor manufacturers achieve precision, reliability, and high-quality results in their production processes.
  • SiC Coated Barrel Susceptor for LPE PE2061S

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    VeTek Semiconductor is a leading SiC Coated Barrel Susceptor for LPE PE2061S manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a SiC-coated barrel susceptor designed specifically for LPE PE2061S 4'' wafers. This susceptor features a durable silicon carbide coating that enhances performance and durability during the LPE (Liquid Phase Epitaxy) process.We welcome you to visit our factory in China.
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  • Silicon carbide nanomaterials

    Silicon carbide nanomaterials (SiC) are materials with at least one dimension at the nanometer scale (1-100nm). These materials can be zero-, one-, two-, or three-dimensional and have diverse applications.

  • Chip Manufacturing: Atomic Layer Deposition (ALD)

    In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

  • Material of silicon carbide epitaxy

    The material of silicon carbide epitaxial layer is silicon carbide, which is usually used to manufacture high-power electronic devices and LEDs. It is widely used in the semiconductor industry due to its excellent thermal stability, mechanical strength and high electrical conductivity.

  • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

    The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

  • A complete explanation of the chip manufacturing process (1/2): from wafer to packaging and testing

    The semiconductor manufacturing process involves eight steps: wafer processing, oxidation, lithography, etching, thin film deposition, interconnection, testing, and packaging. Silicon from sand is processed into wafers, oxidized, patterned, and etched for high-precision circuits.

  • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

    SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

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