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    • China SiC Ring Manufacturer, Supplier, Factory

    As a professional SiC Ring manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable SiC Ring made in China, you can leave us a message.

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    • Silicon-based GaN Epitaxial Susceptor

      Silicon-based GaN Epitaxial Susceptor

      VeTek Semiconductor is a professional manufacturer and supplier, dedicated to providing high-quality Silicon-based GaN Epitaxial Susceptor. The susceptor semiconductor is used in VEECO K465i GaN MOCVD system, high purity, high temperature resistance, corrosion resistance, welcome to inquire and cooperate with us!
    • EPI susceptor

      EPI susceptor

      VeTek Semiconductor's EPI susceptor is designed for the demanding epitaxial equipment applications. Its high-purity silicon carbide (SiC) coated graphite structure offers excellent heat resistance, uniform thermal uniformity for consistent epitaxial layer thickness and resistance, and long-lasting chemical resistance. We look forward to cooperating with you.
    • Horizontal SiC Wafer Carrier

      Horizontal SiC Wafer Carrier

      VeTek Semiconductor is a professional manufacturer and supplier of TaC coated guide ring, horizontal SiC wafer carrier, and SiC coated susceptors in China. We are committed to providing perfect technical support and ultimate product solutions for the semiconductor industry. Welcome to contact us.
    • TaC Coating Pedestal Support Plate

      TaC Coating Pedestal Support Plate

      VeTek Semiconductor's TaC Coating Pedestal Support Plate is a high-precision product designed to meet the specific requirements of semiconductor epitaxy processes. With its TaC coating, high-temperature resistance, and chemical inertness, our product empowers you to produce high-quality EPI layers with high quality. We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
    • PECVD Graphite Boat

      PECVD Graphite Boat

      Vetek Semiconductor's PECVD graphite boat optimizes solar cell coating processes by spacing silicon wafers effectively and inducing glow discharge for uniform coating deposition. With advanced technology and material choices, Vetek semiconductor's PECVD graphite boats enhance silicon wafer quality and boost solar energy conversion efficiency.Pls no hesitate to inquiry us.
    • SiC Cantilever Paddle

      SiC Cantilever Paddle

      VeTek Semiconductor's SiC Cantilever Paddle is a very high performance product. Our SiC Cantilever Paddle is usually used in heat treatment furnaces for handling and supporting silicon wafers, chemical vapor deposition (CVD) and other processing processes in semiconductor manufacturing processes. The high temperature stability and high thermal conductivity of SiC material ensure high efficiency and reliability in the semiconductor processing process. We are committed to providing high-quality products at competitive prices and look forward to becoming your long-term partner in China.
    • Related Blog
    • Reviews

    • Application of TaC-Coated Graphite Parts in Single Crystal Furnaces

      In the growth of SiC and AlN single crystals using the physical vapor transport (PVT) method, crucial components such as the crucible, seed holder, and guide ring play a vital role. As depicted in Figure 2 [1], during the PVT process, the seed crystal is positioned in the lower temperature region, while the SiC raw material is exposed to higher temperatures (above 2400 ℃).

    • Thermal Field Design for SiC Single Crystal Growth

      With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

    • Italy's LPE's 200mm SiC epitaxial technology progress

      This article introduces the latest developments in the newly designed PE1O8 hot-wall CVD reactor of the Italian company LPE and its ability to perform uniform 4H-SiC epitaxy on 200mm SiC.

    • How much do you know about sapphire?

      This article describes that LED substrate is the largest application of sapphire, as well as the main methods of preparing sapphire crystals: growing sapphire crystals by the Czochralski method, growing sapphire crystals by the Kyropoulos method, growing sapphire crystals by the guided mold method, and growing sapphire crystals by the heat exchange method.

    • Principles and Technology of Physical Vapor Deposition Coating (1/2) - VeTek Semiconductor

      Vacuum coating includes film material vaporization, vacuum transportation and thin film growth. According to the different film material vaporization methods and transportation processes, vacuum coating can be divided into two categories: PVD and CVD.

    • Chip Manufacturing: Atomic Layer Deposition (ALD)

      In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

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