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    • China SiC coating soft felt Manufacturer, Supplier, Factory

    As a professional SiC coating soft felt manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable SiC coating soft felt made in China, you can leave us a message.

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    • TaC Coating Plate

      TaC Coating Plate

      VeTek Semiconductor's TaC Coating Plate is a remarkable product that offers exceptional features and advantages. Designed with precision and engineered to perfection, our TaC Coating Plate is specifically tailored for various applications in silicon carbide (SiC) single crystal growth processes.The TaC Coating Plate's precise dimensions and robust construction make it easy to integrate into existing systems, ensuring seamless compatibility and efficient operation. Its reliable performance and high-quality coating contribute to consistent and uniform results in SiC crystal growth applications.We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
    • Physical Vapor Deposition

      Physical Vapor Deposition

      Vetek semiconductor Physical Vapor Deposition (PVD) is an advanced process technology widely used in surface treatment and thin film preparation. PVD technology uses physical methods to directly transform materials from solid or liquid to gas and form a thin film on the surface of the target substrate. This technology has the advantages of high precision, high uniformity and strong adhesion, and is widely used in semiconductors, optical devices, tool coatings and decorative coatings. Welcome to discuss with us!
    • Silicon Carbide Shower Head

      Silicon Carbide Shower Head

      VeTek Semiconductor is a leading manufacturer and supplier of Silicon Carbide Shower Head products in China. SiC Shower Head has excellent high temperature tolerance, chemical stability, thermal conductivity and good gas distribution performance, which can achieve uniform gas distribution and improve film quality. Therefore, it is usually used in high temperature processes such as chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes. Welcome your further consultation.
    • Carbon Carbon Composite PECVD Pallet

      Carbon Carbon Composite PECVD Pallet

      VeTek Semiconductor is a leading Carbon Carbon Composite PECVD Pallet manufacturer and innovator in China.We have been specialized in Carbon related material for many years.Our products are made of high density carbon fiber. We look forward to becoming your long-term partner in China.
    • Disc Susceptor

      Disc Susceptor

      Vetek Semiconductor provide edge-cutting Graphite Disc Susceptor. The SiC coating provides superior thermal stability, excellent chemical resistance, and enhanced process uniformity, ensuring optimal performance and reliability. Experience the next level of efficiency and precision with Vetek Semiconductor's SiC-coated Disc Susceptor.
    • Aixtron G5 MOCVD Susceptors

      Aixtron G5 MOCVD Susceptors

      VeTek Semiconductor is a leading Aixtron G5 MOCVD Susceptors manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a Aixtron G5 MOCVD Susceptors designed specifically for Aixtron G5 MOCVD reactor. This Aixtron G5 MOCVD Susceptors kit is a versatile and efficient solution for semiconductor manufacturing with its optimal size, compatibility, and high productivity.Welcome to inquiry us.
    • Related Blog
    • Reviews

    • What is semiconductor epitaxy process?

      It is ideal to build integrated circuits or semiconductor devices on a perfect crystalline base layer. The epitaxy (epi) process in semiconductor manufacturing aims to deposit a fine single-crystalline layer, usually about 0.5 to 20 microns, on a single-crystalline substrate. The epitaxy process is an important step in the manufacture of semiconductor devices, especially in silicon wafer manufacturing.

    • What is the difference between CVD TaC and sintered TaC?

      This article first introduces the molecular structure and physical properties of TaC, and focuses on the differences and applications of sintered tantalum carbide and CVD tantalum carbide, as well as VeTek Semiconductor's popular TaC coating products.

    • ALD Atomic Layer Deposition Recipe

      Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.

    • Silicon(Si) epitaxy preparation technology

      Single crystal materials alone cannot meet the needs of the growing production of various semiconductor devices. At the end of 1959, a thin layer of single crystal material growth technology - epitaxial growth was developed.

    • The Problems in the Etching Process

      Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

    • Different technical routes of SiC epitaxial growth furnace

      Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

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