China Semiconductor Manufacturer Manufacturer, Supplier, Factory

Vetek Semiconductor offers Porous SiC Ceramic Chuck widely used in wafer processing technology, transfer and other links, suitable for bonding, scribing, patch, polishing and other links, laser processing. Our Porous SiC Ceramic Chuck has Ultra-strong vacuum adsorption, high flatness and high purity meet the needs of most semiconductor industries.Welcome to inquiry us.

VeTek Semiconductor is a leading EPI Wafer Lift Pin manufacturer and innovator in China.We have been specialized in SiC coating on surface of graphite for many years. We offer a EPI Wafer Lift Pin for Epi process. With high quality and competitive price,we welcome you to visit our factory in China.

As one of the leading TaC coating product suppliers in China, VeTek Semiconductor is able to provide customers with high-quality TaC coating customized parts. TaC coated ring for PVT growth of SiC single crystal is one of VeTek Semiconductor's most outstanding and mature products. It plays an important role in the PVT growth of SiC crystal process and can help customers grow high-quality SiC crystals. Looking forward to your inquiry.

VeTek Semiconductor is a professional China manufacturer and supplier, mainly producing SiC coated support rings, CVD silicon carbide (SiC) coatings, tantalum carbide (TaC) coatings, bulk SiC, SiC powders and high-purity SiC materials. We are committed to providing perfect technical support and ultimate product solutions for the semiconductor industry, welcome to contact us.

Vertical furnace SiC coated ring is a component specially designed for Vertical furnace. VeTek Semiconductor can do the best for you in terms of both materials and manufacturing processes. As a leading manufacturer and supplier of Vertical furnace SiC coated ring in China, VeTek Semiconductor is confident that we can provide you with the best products and services.

VeTek Semiconductor is a leading manufacturer and supplier of Silicon Carbide Shower Head products in China. SiC Shower Head has excellent high temperature tolerance, chemical stability, thermal conductivity and good gas distribution performance, which can achieve uniform gas distribution and improve film quality. Therefore, it is usually used in high temperature processes such as chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes. Welcome your further consultation.