Silicon Carbide Shower Head

VeTek Semiconductor Silicon Carbide Shower Head is mainly made of SiC. In semiconductor processing, the main function of Silicon Carbide Shower Head is to evenly distribute the reaction gas to ensure the formation of a uniform film during chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes. Due to the excellent properties of SiC such as high thermal conductivity and chemical stability, SiC Shower Head can work efficiently at high temperatures, reduce the unevenness of gas flow during the deposition process, and thus improve the quality of the film layer.

Silicon Carbide Shower Head can evenly distribute the reaction gas through multiple nozzles with the same aperture, ensure uniform gas flow, avoid local concentrations that are too high or too low, and thus improve the quality of the film. Combined with the excellent high temperature resistance and chemical stability of CVD SiC, no particles or contaminants are released during the film deposition process, which is critical to maintaining the purity of the film deposition.

In addition, another major advantage of CVD SiC Shower Head is its resistance to thermal deformation. This feature ensures that the component can maintain physical structural stability even in high temperature environments typical of chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes. The stability minimizes the risk of misalignment or mechanical failure, thereby improving the reliability and service life of the overall device.

As China's leading Silicon Carbide Shower Head manufacturer and supplier. VeTek Semiconductor CVD Silicon Carbide Shower Head's biggest advantage is the ability to provide customized products and technical services. Our customized service advantage can meet the different requirements of different customers for surface finish. In particular, it supports the refined customization of mature processing and cleaning technologies during the manufacturing process.

In addition, the pore inner wall of VeTek Semiconductor Silicon Carbide Shower Head is carefully treated to ensure that there is no residual damage layer, improving the overall performance under extreme conditions. In addition, our CVD SiC Shower Head is able to achieve a minimum aperture of 0.2 mm, thereby achieving excellent gas delivery accuracy and maintaining optimal gas flow and thin film deposition effects during semiconductor manufacturing.

SEM DATA OF CVD SIC FILM CRYSTAL STRUCTURE：

Basic physical properties of CVD SiC Coating：

VeTek Semiconductor Silicon Carbide Shower Head Shops：