English
Home > Products
  • MOCVD Vacuum Chamber Lid

    • China MOCVD Vacuum Chamber Lid Manufacturer, Supplier, Factory

    As a professional MOCVD Vacuum Chamber Lid manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable MOCVD Vacuum Chamber Lid made in China, you can leave us a message.

    Related Products

    Hot Products

    • 4°off axis p-type SiC Wafer

      4°off axis p-type SiC Wafer

      VeTek Semiconductor is a professional Chinese manufacturer of 4°off axis p-type SiC Wafer, 4H N type SiC Substrate, and 4H Semi Insulating type SiC Substrate. Among them, 4°off axis p-type SiC Wafer is a special semiconductor material used in high-performance electronic devices. VeTek Semiconductor is committed to providing advanced solutions for various SiC Wafer products for the semiconductor industry. We sincerely look forward to your further consultation.
    • Semiconductor Fused Quartz Ring

      Semiconductor Fused Quartz Ring

      VeTeksemi's semiconductor fused quartz ring is an indispensable core component in the semiconductor etching process, with excellent purity, extremely high thermal stability and outstanding chemical resistance.Welcome your further inquiry.
    • CVD SiC Block for SiC Crystal Growth

      CVD SiC Block for SiC Crystal Growth

      VeTek Semiconductor focuses on the research and development and industrialization of CVD-SiC bulk sources, CVD SiC coatings, and CVD TaC coatings. Taking CVD SiC block for SiC Crystal Growth as an example, the product processing technology is advanced, the growth rate is fast, high temperature resistance, and corrosion resistance are strong. Welcome to inquire.
    • 8 Inch Halfmoon Part for LPE Reactor

      8 Inch Halfmoon Part for LPE Reactor

      VeTek Semiconductor is a leading 8 Inch Halfmoon Part for LPE Reactor manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a 8 Inch Halfmoon Part for LPE Reactor designed specifically for LPE SiC epitaxy reactor. This halfmoon part a versatile and efficient solution for semiconductor manufacturing with its optimal size, compatibility, and high productivity.We welcome you to visit our factory in China.
    • SiC Cantilever Paddle

      SiC Cantilever Paddle

      VeTek Semiconductor's SiC Cantilever Paddle is a very high performance product. Our SiC Cantilever Paddle is usually used in heat treatment furnaces for handling and supporting silicon wafers, chemical vapor deposition (CVD) and other processing processes in semiconductor manufacturing processes. The high temperature stability and high thermal conductivity of SiC material ensure high efficiency and reliability in the semiconductor processing process. We are committed to providing high-quality products at competitive prices and look forward to becoming your long-term partner in China.
    • SiC Coating Susceptor

      SiC Coating Susceptor

      Vetek Semiconductor focuses on the research and development and industrialization of CVD SiC coating and CVD TaC coating. Taking SiC coating susceptor as an example, the product is highly processed with high precision, dense CVD SIC coating, high temperature resistance and strong corrosion resistance. An inquiry into us is welcome.
    • Related Blog
    • Reviews

    • What is semiconductor epitaxy process?

      It is ideal to build integrated circuits or semiconductor devices on a perfect crystalline base layer. The epitaxy (epi) process in semiconductor manufacturing aims to deposit a fine single-crystalline layer, usually about 0.5 to 20 microns, on a single-crystalline substrate. The epitaxy process is an important step in the manufacture of semiconductor devices, especially in silicon wafer manufacturing.

    • The Development History of 3C SiC

      Through continuous technological progress and in-depth mechanism research, 3C-SiC heteroepitaxial technology is expected to play a more important role in the semiconductor industry and promote the development of high-efficiency electronic devices.

    • What is Porous Graphite? - VeTek Semiconductor

      This article describes the physical parameters and product characteristics of VeTek Semiconductor's Porous Graphite, as well as its specific applications in semiconductor processing.

    • What’s the difference between Silicon Carbide and Tantalum Carbide Coatings?

      This article analyzes the product characteristics and application scenarios of tantalum carbide coating and silicon carbide coating from multiple perspectives.

    • What is the difference between CVD TaC and sintered TaC?

      This article first introduces the molecular structure and physical properties of TaC, and focuses on the differences and applications of sintered tantalum carbide and CVD tantalum carbide, as well as VeTek Semiconductor's popular TaC coating products.

    • Chip manufacturing: A process flow of MOSFET

      The chip manufacturing process includes photolithography,etching, diffusion, thin film, ion implantation, chemical mechanical polishing, cleaning, etc. This article roughly explains how these processes are integrated in sequence to manufacture a MOSFET.

    Send Inquiry

    Hit enter to search or ESC to close
    X
    We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
    Reject Accept